Sasago M | Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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概要
関連著者
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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白井 正充
大阪府立大学大学院工学研究科
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Shirai Masamitsu
Osaka Prefecture Univ. Osaka Jpn
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Matsuo Takahiro
Matsushita Electric Industrial Co. Ltd. (panasonic)
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Tsunooka M
Osaka Prefecture Univ. Osaka Jpn
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Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
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Endo M
Department Of Physics School Of Science Tokai University
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白井 正充
大阪府立大学 大学院 工学研究科
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ENDO Masamori
Department of Physics, School of Science, Tokai University
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Ohfuji T
Semiconductor Leading Edge Technologies Inc. (selete)
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SASAGO Masaru
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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角岡 正弘
大阪府立大学大学院工学研究科
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Sasago Masaru
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)uls
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Matsuo T
Semiconductor Leading Edge Technologies Inc
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Sasago Masaru
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Takahashi M
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Sasago Masaru
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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OHFUJI Takeshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Endo Masayuki
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Nomura Noboru
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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Nomura N
Semiconductor Research Center Matsushita Electric Industrial Company Ltd.
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Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
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Endo Masayuki
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Matsuo T
Matsushita Electric Industrial Co. Ltd. (panasonic)
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Nomura Noboru
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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TSUNOOKA Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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Matsuo Taku
The Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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Yamashita K
Graduate School Of Engineering Osaka Prefecture University
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Mori S
Department Of Electric And Electrical Engineering School Of Science And Engineering Saga University
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MORI Shigeyasu
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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TAKAHASHI Makoto
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Matsuo T
The Author Is With The Tr Production Division Rohm-apollo Device Co. Ltd.
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IRIE Shigeo
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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ENDO Masayuki
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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SASAGO Masaru
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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Yamashita Kazuhiro
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Tani Yoshiyuki
Semiconductor Research Center, Matsushita Electric Industrial Co. Ltd.
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Tagawa S
Osaka Univ. Osaka
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Yamashita K
Osaka Prefecture Univ. Sakai‐shi Jpn
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Irie S
Semiconductor Leading Edge Technologies Ibaraki Jpn
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Tani Yoshiyuki
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Yamashita Kazuhiro
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Nakazawa K
Process & Manufacturing Engineering Center Toshiba Co. Semicoundactor Company
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田中 誠
大阪府大 工
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Matsuzawa N
Assoc. Super‐advanced Electronics Technol. Kanagawa Pref. Jpn
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Tsunooka Masahiro
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Ohba Tadahiro
Osaka Prefecture Univ. Osaka Jpn
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Kametani Hitoshi
General Research Laboratory Mitubishi Electric Corporation
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Kitamura T
Material And Life Science Graduate School Of Engineering Osaka University
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Kondo H
The Institute Of Scientific And Industrial Research Osaka University
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Kamon K
Assoc. Super‐advsnced Electronics Technol. Kanagawa Jpn
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Kamon K
Kwansei Gakuin Univ. Nishinomiya
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Kamon Kazuya
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ul
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Kamon Kazuya
School Of Science Kwansei Gakuin University
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Ogawa Kazufumi
Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.
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MATSUO Takahiro
Semiconductor Leading Edge Technologies, Inc.
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Ogawa Keiichi
National Research Institute For Metals
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Kondo Hideyuki
Central Research Institute Mitsubishi Materials Corporation
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Yamaguchi A
Hitachi Ltd. Tokyo Jpn
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Yamaguchi Atsumi
Ulsi Development Center Mitsubishi Electric Corporation
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MURAKAMI Katsuhiko
Nikon Corporation
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NAKAZAWA Keisuke
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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ONODERA Toshio
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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TAKAHASHI Makoto
Association of Super-Advanced Electronics Technologies
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OHFUJI Takeshi
Association of Super-Advanced Electronics Technologies
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SASAGO Masaru
Association of Super-Advanced Electronics Technologies
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KISHIMURA Shinji
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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KUHARA Koichi
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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MORISAWA Taku
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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MATSUZAWA Nobuyuki
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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ENDO Masayuki
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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Koizumi Taichi
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Ogawa K
Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.
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岡村 晴之
大阪府立大学大学院工学研究科
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Kitamura Takayuki
Material And Life Science Graduate School Of Engineering Osaka University
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MATSUOKA Kaoru
AVC Products Development Laboratory, Matsushita Electric Industrial Co., Ltd.
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Kanzaki Kenichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamaguchi Atsuko
Central Research Laboratory Hitachi Ltd.
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Yamaguchi Atsuko
Association Of Super-advanced Electronics Technologies:(present Address)hitachi Central Laboratory
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Ogawa K
Department Of Advanced Materials Science Faculty Of Engineering Kagawa University
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Yamaguchi A
Sumitomo Electric Ind. Ltd. Yokohama Jpn
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Kondo H
Nikon Corp.
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Kamon K
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ul
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Irie Shigeo
Semiconductor Leading Edge Technologies Inc. (selete)
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Matsuoka Kaoru
Avc Products Development Laboratory Matsushita Electric Industrial Co. Ltd.
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Morisawa T
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ce
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Morisawa T
Hitachi Ltd. Tokyo Jpn
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Kuhara K
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Se
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Kuhara Koichi
Tsukuba Research Center Sanyo Electric Co. Ltd.
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Sasago Masaru
Matsushita Electric Industrial Co.
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Koizumi T
Nihon Spindle Mfg. Co. Ltd.
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Uematsu M
Ntt Basic Research Laboratories Ntt Corporation
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Ohtsuka H
Association Of Super-advanced Electronics Technologies:(present) Semiconductor Leading Edge Technolo
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KANDAKA Noriaki
Nikon Co.
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KONDO Hiroyuki
Nikon Co.
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SUYAMA Kanji
Department of Applied Chemistry, Osaka Prefecture University
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LALEVEE Jacques
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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ALLONAS Xavier
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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FOUASSIER Jean-Pierre
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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QU Weihong
Department of Applied Chemistry, Osaka Prefecture University
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Qu Weihong
Department Of Applied Chemistry Osaka Prefecture University
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TACHI Hideki
Department of Applied Chemistry, Osaka Prefecture University
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Kishima Takamasa
Nihon Spindle Mfg. Co. Ltd.
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Tachi Hideki
Department Of Applied Chemistry Osaka Prefecture University
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Kandaka N
Nikon Corp.
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Shinozuka T
Osaka Prefecture Univ. Osaka Jpn
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Nakazawa Keisuke
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)sem
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Uematsu Masaya
NTT Basic Research Laboratories, NTT Corporation
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MURAKAMI Katsuhiko
Nikon Corp.
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岡村 晴之
大阪府立大学 大学院 工学研究科 応用化学分野
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Koizumi Taichi
Semiconductor Research Center, Matsushita Electric Ind. Co. Ltd., Moriguchi, Osaka 570
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原田 知佳
大阪府立大学大学院工学研究科
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川崎 真一
大阪ガス(株)
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OGAWA Tohru
Semiconductor Leading Edge Technologies, Inc.
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UEMATSU Masaya
Semiconductor Leading Edge Technologies, Inc.
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OHTSUKA Hiroshi
Semiconductor Leading Edge Technologies, Inc.
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OGAWA Tohru
Association of Super-Advanced Electronics Technologies
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UEMATSU Masaya
Association of Super-Advanced Electronics Technologies
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ONODERA Toshio
Association of Super-Advanced Electronics Technologies
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NAKAZAWA Keisuke
Association of Super-Advanced Electronics Technologies
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OHTSUKA Hiroshi
Association of Super-Advanced Electronics Technologies
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山田 光昭
大阪ガス(株)
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Yamaguchi Atsuko
Association of Super-Advanced Electronics Technologies
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Kishimura Sinji
Association of Super-Advanced Electronics Technologies
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Matsuzawa Nobuyuki
Association of Super-Advanced Electronics Technologies
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Tanaka Tomoaki
The Institute of Scientific and Industrial Research, Osaka University
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YUITO Takashi
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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WIAUX Vincent
IMEC vzw
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VAN LOOK
IMEC vzw
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VANDENBERGHE Geert
IMEC vzw
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MATSUO Takahiro
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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MISAKA Akio
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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KAIMOTO Yuko
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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MATSUO Takahiro
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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Matsuoka Kouji
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Katsuyama Akiko
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Kobayashi Satoshi
Semiconductor Research Center, Matsushita Electric Industrial Co. Ltd.
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藤木 剛
大阪ガス(株)
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Kishimura Shinji
Ulsi Laboratory Mitsubishi Electric Corporation:semiconductor Group System Lsi Division
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ISHIHARA Takeshi
Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd.,
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TAKECHI Satoshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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YAMAGUCHI Atsuko
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Kaimoto Y
Yokohama Research Center Association Of Super-advanced Electronics Technologies (aset)
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Sasago Masaru
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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MATSUOKA Koji
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Takechi Satoshi
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Pr
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OHBA Tadahiro
Department of Applied Chemistry, Osaka Prefecture University
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NAKAI Daisuke
Department of Applied Chemistry, Osaka Prefecture University
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陶山 寛治
大阪府立大学大学院工学研究科物質系専攻応用化学分野
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OHFUJI Takeshi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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SASAGO Masaru
Advanced Technology Department ULSI Process Technology Development Center, Matsushita Electronics Co
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Katsuyama A
Osaka Prefecture Univ. Osaka Jpn
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Katsuyama Akiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Katsuyama Akiko
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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NOMURA Noburu
Semiconductor Research Center, Matsushita Electric Ind.
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DAS Siddhartha
Components Research, Ontel Corporation
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Das Siddhartha
Components Research Ontel Corporation
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Morishita S
Osaka Prefecture Univ. Osaka Jpn
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山田 光昭
大阪ガス
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Ishihara Takeshi
Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.
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山田 宙
大阪府立大学大学院工学研究科
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Tanaka Tomoaki
The Institute Of Scientific And Industrial Research Osaka University
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Kishimura Shinji
Association of Super-Advanced Electronics Technologies
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Takeuchi Satoshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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MATSUOKA Koji
Semiconductor Leading Edge Technologies, Inc.
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Matsuoka Kouji
Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd., Moriguchi 570
著作論文
- フォトポリマーの研究 : 継続は力なり
- 大阪府立大学中百舌鳥キャンパス
- Fabrication of 0.1 μm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography
- Fabrication of 0.13-μm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques
- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
- Study of the Bottom Antireflective Coating Process Using a High-Transparency Resist for ArF Excimer Laser Lithography
- Challenges to 0.1 μm Resolution Capability in ArF Single Layer Resist Process with Weak Resolution Enhancement Techniques
- Characterization of Chemically Amplified Resists with"Acid Amplifier"for 193nm Lithography
- "Mask Enhancer" Technology on ArF Immersion Tool for 45-nm-Node Complementary Metal Oxide Semiconductor with 0.249μm^2 Static Random Access Memory Contact Layer Fabrication
- Sob-0.1-μm-Pattern Fabrication Using a 193-nm Top Surface Imaging (TSI) Process
- New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
- Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- エポキシ含有フルオレン : ポリシランブレンド系の光架橋
- スルホン酸エステル含有エポキシ架橋剤を用いた再可溶化型架橋系
- 新規スルホン酸エステル基を含有するエポキシポリマーの光架橋と水への再溶解
- A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
- A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement
- Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193nm Lithography II : Protection Groups Containing an Adamantyl Unit
- A New Analytical Technique for Evaluating Standing Wave Effect of Chemically Amplified Positive Resist
- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- リワーク能を有する光架橋・硬化樹脂
- 熱分解型多官能架橋剤を用いたリワーク型光架橋系
- リワーク機能を有する光架橋・硬化樹脂
- Photocrosslinking of Oligomers Bearing Glycidyl Sulfonate Ester Units and Their Redissolution Property
- 水による溶解除去が可能なオキセタン部位含有光架橋性高分子 (特集:光とネットワークポリマー)
- 光重合
- Photocrosslinking and Thermal Degradation of Epoxy-containing Polymers Using Photobase Generators
- 超微細加工用フォトレジスト材料
- Effect of Anions on Photoreacitivity and Stability of Quaternary Ammonium Salts as Photobase Generators
- 光酸・塩基発生剤の開発とその新規フォトポリマー設計における活用
- 再溶解型光架橋・硬化樹脂
- Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
- Visible Light-induced Cationic Polymerization of Epoxides Sensitized by Benzoquinonylsulfanyl Derivatives
- Photo-Induced Radical Polymerization Sensitized by Benzoquinonylsulfanyl Derivatives
- Photo- and Thermochemical Behavior of Quaternary Ammonium Thiocyanates and Their Use as Crosslinkers
- Triplet State of O-Acyloximes Studied by Time-Resolved Absorption Spectroscopy
- Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography
- Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists
- ポリビニルアルコ-ル存在下における塩化第二鉄の光還元反応
- 熱分解型ジエポキシ化合物を用いた再可溶化型架橋性高分子
- Fundamental study of the mask topography effect on the advanced phase-shifting masks for next-generation lithography (Special issue: Microprocesses and nanotechnology)
- Approach to Next-Generation Optical Lithography
- Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process
- Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrenes Derivatives by 146 nm Light
- Surface Modification Resists Using Photoacid and Photobase Generating Polymers
- Photolysis of Quaternary Ammonium Dithiocarbamates and Their Use as Photobase Generators
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Sulfonic Acid Generating Polymers for 146 nm Irradiation
- Positive Surface Modification Resist System
- 亜臨界水を用いた架橋樹脂の分解とケミカルリサイクル (特集 ポリマーの分解とその応用技術)
- FRPの分解とリサイクル (特集:廃棄物の再資源化技術)
- Development of Novel Photosensitive Polymer Systems Using Photoacid and Photobase Generators
- Visible Light Crosslinking of Polymeric Photobase Generators Using Ketobiscoumarins
- Poly(α-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography (2) F2 Excimer Laser Exposure Characteristics
- 解説記事 再可溶化できる光架橋型高分子
- グリーンケミストリーと高分子の崩壊と安定化 (特集 グリーンテクノロジーの新展開)
- 高分子材料の光分解性と高分子添加剤 (新春特集 高分子添加剤の開発とグリーンケミストリー)
- 再溶解能を有する光架橋性ポリマー
- メタクリル酸メチル-アクリル酸エステル共重合体の185nm光によるアブレーティブ分解
- Photocrosslinking of Polymers with Ether Units Using Imino Sulfonate Photoacid Generators
- ポリクラウンエ-テルを用いるイオンクロマトグラフィ-
- 光2量化型ポリマ-
- 光によるアミンの生成を利用する表面修飾型フォトレジスト
- 表面イメ-ジング法によるフォトリソグラフィ-と水の収着
- 表面修飾を利用したフォトレジスト
- UV/EB硬化技術--高分子材料への活用 (小特集 UV/EB硬化技術の最新の展開)
- リワーク型低収縮ジメタクリラートとそのUVインプリント材料への応用 : 樹脂構造の影響 (特集 光とネットワークポリマー)