Sasago M | Matsushita Electric Industrial Corp. Ltd.
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概要
関連著者
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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白井 正充
大阪府立大学大学院工学研究科
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Shirai Masamitsu
Osaka Prefecture Univ. Osaka Jpn
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Ohfuji T
Semiconductor Leading Edge Technologies Inc. (selete)
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白井 正充
大阪府立大学 大学院 工学研究科
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SASAGO Masaru
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Matsuo T
Semiconductor Leading Edge Technologies Inc
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Takahashi M
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Sasago Masaru
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)uls
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Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
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OHFUJI Takeshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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ENDO Masamori
Department of Physics, School of Science, Tokai University
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Endo M
Department Of Physics School Of Science Tokai University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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TAKAHASHI Makoto
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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Tagawa S
Osaka Univ. Osaka
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Nakazawa K
Process & Manufacturing Engineering Center Toshiba Co. Semicoundactor Company
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Kametani Hitoshi
General Research Laboratory Mitubishi Electric Corporation
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Kondo H
The Institute Of Scientific And Industrial Research Osaka University
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Kamon K
Assoc. Super‐advsnced Electronics Technol. Kanagawa Jpn
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Kamon K
Kwansei Gakuin Univ. Nishinomiya
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Kamon Kazuya
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ul
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Kamon Kazuya
School Of Science Kwansei Gakuin University
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Kondo Hideyuki
Central Research Institute Mitsubishi Materials Corporation
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Yamaguchi A
Hitachi Ltd. Tokyo Jpn
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Yamaguchi Atsumi
Ulsi Development Center Mitsubishi Electric Corporation
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Mori S
Department Of Electric And Electrical Engineering School Of Science And Engineering Saga University
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MURAKAMI Katsuhiko
Nikon Corporation
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NAKAZAWA Keisuke
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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ONODERA Toshio
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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MORI Shigeyasu
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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TAKAHASHI Makoto
Association of Super-Advanced Electronics Technologies
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OHFUJI Takeshi
Association of Super-Advanced Electronics Technologies
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SASAGO Masaru
Association of Super-Advanced Electronics Technologies
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KISHIMURA Shinji
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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IRIE Shigeo
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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ENDO Masayuki
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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SASAGO Masaru
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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岡村 晴之
大阪府立大学大学院工学研究科
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角岡 正弘
大阪府立大学大学院工学研究科
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Kanzaki Kenichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamaguchi Atsuko
Central Research Laboratory Hitachi Ltd.
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Yamaguchi Atsuko
Association Of Super-advanced Electronics Technologies:(present Address)hitachi Central Laboratory
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Yamaguchi A
Sumitomo Electric Ind. Ltd. Yokohama Jpn
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Kondo H
Nikon Corp.
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Kamon K
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ul
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Irie S
Semiconductor Leading Edge Technologies Ibaraki Jpn
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Irie Shigeo
Semiconductor Leading Edge Technologies Inc. (selete)
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Sasago Masaru
Matsushita Electric Industrial Co.
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Uematsu M
Ntt Basic Research Laboratories Ntt Corporation
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Ohtsuka H
Association Of Super-advanced Electronics Technologies:(present) Semiconductor Leading Edge Technolo
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KANDAKA Noriaki
Nikon Co.
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KONDO Hiroyuki
Nikon Co.
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Kandaka N
Nikon Corp.
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Matsuzawa N
Assoc. Super‐advanced Electronics Technol. Kanagawa Pref. Jpn
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Nakazawa Keisuke
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)sem
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Ohba Tadahiro
Osaka Prefecture Univ. Osaka Jpn
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Uematsu Masaya
NTT Basic Research Laboratories, NTT Corporation
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MURAKAMI Katsuhiko
Nikon Corp.
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岡村 晴之
大阪府立大学 大学院 工学研究科 応用化学分野
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原田 知佳
大阪府立大学大学院工学研究科
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川崎 真一
大阪ガス(株)
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OGAWA Tohru
Semiconductor Leading Edge Technologies, Inc.
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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UEMATSU Masaya
Semiconductor Leading Edge Technologies, Inc.
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OHTSUKA Hiroshi
Semiconductor Leading Edge Technologies, Inc.
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OGAWA Tohru
Association of Super-Advanced Electronics Technologies
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UEMATSU Masaya
Association of Super-Advanced Electronics Technologies
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ONODERA Toshio
Association of Super-Advanced Electronics Technologies
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NAKAZAWA Keisuke
Association of Super-Advanced Electronics Technologies
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OHTSUKA Hiroshi
Association of Super-Advanced Electronics Technologies
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山田 光昭
大阪ガス(株)
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Yamaguchi Atsuko
Association of Super-Advanced Electronics Technologies
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Kishimura Sinji
Association of Super-Advanced Electronics Technologies
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Matsuzawa Nobuyuki
Association of Super-Advanced Electronics Technologies
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Tanaka Tomoaki
The Institute of Scientific and Industrial Research, Osaka University
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KUHARA Koichi
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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MORISAWA Taku
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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MATSUZAWA Nobuyuki
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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ENDO Masayuki
Yokohama Research Center, Association of Super-advanced Electronics Technologies (ASET)
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藤木 剛
大阪ガス(株)
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TAKECHI Satoshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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YAMAGUCHI Atsuko
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Morisawa T
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ce
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Morisawa T
Hitachi Ltd. Tokyo Jpn
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Kuhara K
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Se
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Kuhara Koichi
Tsukuba Research Center Sanyo Electric Co. Ltd.
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Takechi Satoshi
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Pr
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OHBA Tadahiro
Department of Applied Chemistry, Osaka Prefecture University
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NAKAI Daisuke
Department of Applied Chemistry, Osaka Prefecture University
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SUYAMA Kanji
Department of Applied Chemistry, Osaka Prefecture University
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陶山 寛治
大阪府立大学大学院工学研究科物質系専攻応用化学分野
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OHFUJI Takeshi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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SASAGO Masaru
Advanced Technology Department ULSI Process Technology Development Center, Matsushita Electronics Co
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山田 光昭
大阪ガス
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Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
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Tanaka Tomoaki
The Institute Of Scientific And Industrial Research Osaka University
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Kishimura Shinji
Association of Super-Advanced Electronics Technologies
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Takeuchi Satoshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
著作論文
- フォトポリマーの研究 : 継続は力なり
- 大阪府立大学中百舌鳥キャンパス
- Fabrication of 0.1 μm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography
- Fabrication of 0.13-μm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques
- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
- Study of the Bottom Antireflective Coating Process Using a High-Transparency Resist for ArF Excimer Laser Lithography
- Challenges to 0.1 μm Resolution Capability in ArF Single Layer Resist Process with Weak Resolution Enhancement Techniques
- Characterization of Chemically Amplified Resists with"Acid Amplifier"for 193nm Lithography
- エポキシ含有フルオレン : ポリシランブレンド系の光架橋
- スルホン酸エステル含有エポキシ架橋剤を用いた再可溶化型架橋系
- 新規スルホン酸エステル基を含有するエポキシポリマーの光架橋と水への再溶解
- Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193nm Lithography II : Protection Groups Containing an Adamantyl Unit
- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- リワーク能を有する光架橋・硬化樹脂
- 熱分解型多官能架橋剤を用いたリワーク型光架橋系
- リワーク機能を有する光架橋・硬化樹脂
- Photocrosslinking of Oligomers Bearing Glycidyl Sulfonate Ester Units and Their Redissolution Property
- 水による溶解除去が可能なオキセタン部位含有光架橋性高分子 (特集:光とネットワークポリマー)
- 光重合
- Photocrosslinking and Thermal Degradation of Epoxy-containing Polymers Using Photobase Generators
- 超微細加工用フォトレジスト材料
- Effect of Anions on Photoreacitivity and Stability of Quaternary Ammonium Salts as Photobase Generators
- 光酸・塩基発生剤の開発とその新規フォトポリマー設計における活用
- Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography
- Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists
- 熱分解型ジエポキシ化合物を用いた再可溶化型架橋性高分子
- Approach to Next-Generation Optical Lithography
- 亜臨界水を用いた架橋樹脂の分解とケミカルリサイクル (特集 ポリマーの分解とその応用技術)
- FRPの分解とリサイクル (特集:廃棄物の再資源化技術)
- UV/EB硬化技術--高分子材料への活用 (小特集 UV/EB硬化技術の最新の展開)
- リワーク型低収縮ジメタクリラートとそのUVインプリント材料への応用 : 樹脂構造の影響 (特集 光とネットワークポリマー)