Tagawa Seiichi | The Institute Of Scientific And Industrial Research
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概要
関連著者
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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関 修平
大阪大学産業科学研究所
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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Seki Shu
The Institute Of Scientific And Industrial Research
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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SHIMOKAWA Tsutomu
JSR Corp.
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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KAI Toshiyuki
JSR Corp.
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吉田 陽一
阪大産研
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Saeki Akinori
Osaka Univ. Osaka Jpn
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
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Seki S
Osaka Univ. Osaka
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Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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YAMAMOTO Yukio
The Institute of Scientific and Industrial Research, Osaka University
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田川 精一
阪大産研
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KOBAYASHI Kazuo
The Institute of Scientific and Industrial Research, Osaka University
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Matsui Yoshinori
The Institute Of Scientific And Industrial Research Osaka University
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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小林 一雄
The Institute Of Scientific And Industrial Research Osaka University
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Suzuki Shinnichiro
Department Of Chemistry Graduate School Of Science Osaka University
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Suzuki S
Hiroshima Univ. Hiroshima
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Seki Shuhei
The Institute Of Scientific And Industrial Research Osaka University
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Suzuki S
Department Of Chemistry Graduate School Of Science Osaka University
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TSUKUDA Satoshi
The Institute of Scientific and Industrial Research, Osaka University
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MATSUI Yoshinori
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research Osaka University
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TERO Ryugo
Institute for Molecular Science
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YUKAWA Hiroto
Tokyo Ohka Kogyo Co., Ltd.
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Suzuki Shunichi
Central Research Laboratories Ajinomoto Co. Inc.
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Santillan Julius
Semiconductor Leading Edge Technologies Inc.
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Tagawa S
Osaka Univ. Osaka
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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Hirose Ryo
The Institute Of Scientific And Industrial Research Osaka University
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Nakao Satoshi
Institute For Molecular Science
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Ohfuji T
Semiconductor Leading Edge Technologies Inc. (selete)
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Shigaki Takumi
The Institute Of Scientific And Industrial Research Osaka University
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UNO Hidetaka
Institute for Molecular Science
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Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
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山本 嘉則
東北大院理
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Yoshida K
Department Of Chemistry Graduate School Of Science Osaka University
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Kai Yasushi
大阪大学 工学研究科応用化学
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Yamaguchi K
Osaka Univ. Osaka
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YAMAGUCHI Kazuya
Department of Chemistry, Graduate School of Science, Osaka University
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MAETANI Takehiko
Department of Chemistry, Graduate School of Science, Osaka University
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SUGIMOTO Masaki
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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Mukaigawa Yasuhiro
The Institute of Scientific and Industrial Research, Osaka University
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MOCHIDA Kunio
Department of Chemistry, Faculty of Science, Gakusyuin University
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YOSHIDA Yohichi
The Institute of Scientific and Industrial Research, Osaka University
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Hirosawa Ichiro
Japan Synchrotron Radiation Res. Inst. (jasri) Hyogo Jpn
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ONODERA Junichi
Tokyo Ohka Kogyo Co., Ltd.
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KOGANESAWA Tomoyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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HORIE Kazuyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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Urisu Tsuneo
Institute for Molecular Science
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Kanzaki Kenichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamaguchi Kazuya
Department Of Chemistry Graduate School Of Science Osaka University
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Maetani Takehiko
Department Of Chemistry Graduate School Of Science Osaka University
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Zhang Zheng
The Graduate University For Advanced Studies
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Urisu Tsuneo
Insti. Mol. Sci. Dept. Vacuum Uv Photosci
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Wishart James
Chemistry Department Brookhaven National Laboratory
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Mochida K
Department Of Chemistry Faculty Of Science Gakushuin University
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Mochida Kunio
Department Of Chemistry Faculty Of Science Gakushuin University
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
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Yoshida Y
The Institute Of Scientific And Industrial Research Osaka University
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Toriumi Minoru
Semiconductor Leading Edge Technologies Inc.(selete)
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SHIGAKI Takumi
The Institute of Scientific and Industrial Research, Osaka University
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SUZUI Mitsukazu
Institute for Molecular Science
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NONOGAKI Youichi
Institute for Molecular Science
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LEE Eun-Hye
Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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KAMIGAITO Yoshiki
Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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TSUJIMOTO Takashi
Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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SEKI Shu
Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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UYAMA Hiroshi
Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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SUNG Moon-Hee
Department of Bio and Nanochemistry, Kookmin University
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Nojiri Masaki
Department Of Chemistry Graduate School Of Science Osaka University
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吉田 起國
京大原子エネルギー研
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KUSANO Eiji
Department of Internal Medicine, Division of Nephrology, Jichi Medical University
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HORIBE Hideo
Department of Materials Science and Engineering, Kochi National College of Technology
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Umeda S
Hokkaido Univ. Sapporo Jpn
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YANG Jinfeng
The Institute of Scientific and Industrial Research, Osaka University
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YOSHIDA Youichi
The Institute of Scientific and Industrial Research, Osaka University
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TANAKA Shigeru
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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TSUJI Shou
The Institute of Scientific and Industrial Research, Osaka University
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NISHIDA Kazutaka
The Institute of Scientific and Industrial Research, Osaka University
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SEKI Shu
Institute of Scientific and Industrial Research, Osaka University
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NAGAHARA Seiji
The Institute of Scientific and Industrial Research, Osaka University
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YAMASHITA Yoshio
SORTEC Corporation
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TAGUCHI Takao
SORTEC Corporation
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Murata Yuya
Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U
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Takei Satoshi
Nissan Chemical Ind. Ltd. Toyama Jpn
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Takei Satoshi
Nissan Chemical Industries Ltd.
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Lee Eun-hye
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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Seki Shu
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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Seki Shu
The Institute Of Scientific And Industrial Research Osaka University
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Yagi Yasushi
The Institute Of Scientific And Industrial Research Osaka University
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Arimitsu Koji
Department Of Pure And Applied Chemistry Faculty Of Science And Technology Tokyo University Of Scien
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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Sung Moon‐hee
Bioleaders Corporation And Dept. Bio & Nanochemistry Kookmin University Korea
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Kimura Takehiko
Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U
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Tsuji Shinsuke
Department Of Chemistry Tokyo Institute Of Technology And Crest Japan Science And Technology Corpora
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Umeda Satoshi
The Institute Of Scientific And Industrial Research Osaka University
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NAKA Yukihiko
Faculty of Biology Oriented Science and Technology, Kinki University
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KASE Masataka
Fujitsu Ltd.
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Yamaguchi A
Hitachi Ltd. Tokyo Jpn
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Yamaguchi Atsumi
Ulsi Development Center Mitsubishi Electric Corporation
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KUWANO Naoko
Department of Chemistry, Faculty of Science, Gakushuin University
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NAGAO Haruka
Department of Chemistry, Faculty of Science, Gakushuin University
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HATA Rieko
Department of Chemistry, Faculty of Science, Gakushuin University
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CHIBA Hiromi
Department of Chemistry, Faculty of Science, Gakushuin University
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute (jasri)
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SAEKI Akinori
Institute of Scientific and Industrial Research, Osaka University
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FUKUYAMA Takehiro
The Institute of Scientific and Industrial Research, Osaka University
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TAKASU Ryoichi
Tokyo Ohka Kogyo Co., Ltd.
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OHFUJI Takeshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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SASAGO Masaru
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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TAKAHASHI Makoto
Association of Super-Advanced Electronics Technologies
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OHFUJI Takeshi
Association of Super-Advanced Electronics Technologies
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SASAGO Masaru
Association of Super-Advanced Electronics Technologies
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ISHIKAWA Seiichi
Semiconductor Leading Edge Technolgies, Inc.
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Matsuo T
Semiconductor Leading Edge Technologies Inc
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Yamaguchi Atsuko
Association of Super-Advanced Electronics Technologies
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Kishimura Sinji
Association of Super-Advanced Electronics Technologies
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Matsuzawa Nobuyuki
Association of Super-Advanced Electronics Technologies
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Tanaka Tomoaki
The Institute of Scientific and Industrial Research, Osaka University
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HIJIKATA Hayato
The Institute of Scientific and Industrial Research, Osaka University
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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MATSUI Yoshihisa
Faculty of Life and Environmental Science, Shimane University
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ACHARYA Anjali
ISIR Osaka University
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KOIZUMI Yoshiko
ISIR Osaka University
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KOIZUMI Yoshiko
The Institute of Scientific and Industrial Research, Osaka University
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ACHARYA Anjali
The Institute of Scientific and Industrial Research, Osaka University
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Sung Moon-hee
Department Of Bio And Nanochemistry Kookmin University
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Yamaguchi Yoh-ichi
Hoya Corporation
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Kondoh Takafumi
The Institute Of Scientific And Industrial Research Osaka University
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Oiki Shigetoshi
Faculty Of Medical Sciences University Of Fukui
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Motoyoshi Kenji
Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U
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Yamaguchi Atsuko
Central Research Laboratory Hitachi Ltd.
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Yamaguchi Atsuko
Association Of Super-advanced Electronics Technologies:(present Address)hitachi Central Laboratory
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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NAKAMURA Jun
The Institute of Scientific and Industrial Research, Osaka University
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FURUKAWA Kikuo
Mitsubishi Gas Chemical Co., Inc.
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SUGAWARA Hidekazu
The Institute of Scientific and Industrial Research, Osaka University
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HIROSE Ryo
The Institute of Scientific and Industrial Research, Osaka University
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CAO Heidi
Intel Corporation
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DENG Hai
Intel Corporation
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LEESON Michael
Intel Corporation
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Yamaguchi A
Sumitomo Electric Ind. Ltd. Yokohama Jpn
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Takahashi M
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Sugawara Hidekazu
The Institute Of Scientific And Industrial Research Osaka University
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NEMOTO Hiroaki
JSR Corp.
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ANDO Tomoyuki
Tokyo Ohka Kogyo Co., Ltd.
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KOMANO Hiroji
Tokyo Ohka Kogyo Co., Ltd.
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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Hata R
Department Of Chemistry Faculty Of Science Gakushuin University
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Acharya Anjali
The Institute Of Scientific And Industrial Research Osaka University
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Tsuji Shou
Received August 21 2001; Cl-010821
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Chiba Hiromi
Department Of Chemistry College Of Humanities And Sciences Nihon University
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Chiba Hiromi
Department Of Chemistry Faculty Of Science Gakushuin University
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Kuwano Naoko
Department Of Chemistry Faculty Of Science Gakushuin University
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Nagao Haruka
Department Of Chemistry Faculty Of Science Gakushuin University
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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Sasago Masaru
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)uls
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Maeda Kensaku
The Institute Of Scientific And Industrial Research Osaka University
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Naka Yukihiko
Faculty Of Biology Oriented Science And Technology Kinki University
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Taguchi T
Department Of Electrical And Electronic Engineering Yamaguchi University
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Uyama Hiroshi
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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Takei Satoshi
Nissan Chemical Inst. Ltd. Chiba Jpn
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Sakurai Yusuke
The Institute Of Scientific And Industrial Research Osaka University
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Nagahara S
Nec Electronics Corp. Kanagawa Jpn
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Kishida Masaru
Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U
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Kamigaito Yoshiki
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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OHFUJI Takeshi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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SASAGO Masaru
Advanced Technology Department ULSI Process Technology Development Center, Matsushita Electronics Co
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Koizumi Yoshiko
The Institute Of Scientific And Industrial Research Osaka University
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KUNIMI Yoshihisa
The Institute of Scientific and Industrial Research, Osaka University
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Yamamoto Y
Sankyo Co. Ltd. Tokyo
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ZHANG Zheng-Long
The Graduate University for Advanced Studies, Institute for Molecular Science
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CHIANG Tsung-Yi
Institute for Molecular Science
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SUZUI Kouichi
Institute for Molecular Science
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Ishikawa Seiichi
Semiconductor Leading Edge Technolgies Inc.
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Idesaki Akira
Takasaki Radiation Chemistry Institute Japan Atomic Energy Research Laboratories
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Takasu Ryoichi
Tokyo Ohka Kogyo Co. Ltd.
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UNO Hidetaka
Graduate University for Advanced Studies
著作論文
- Preparation of Poly(γ-glutamic acid) Hydrogel / Apatite Composites and Their Application for Scaffold of Cell Proliferation
- Pulse Radiolysis of Hexameric Nitrite Reductase Containing Two Type 1 Cu Sites in a Monomer
- The Intramolecular Electron Transfer between the Type 1 Cu and the Type 2 Cu in a Mutant of Hyphomicrobium Nitrite Reductase
- Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
- Nanowire Formation and Selective Adhesion on Substrates by Single-Ion Track Reaction in Polysilanes
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) : Relation between Resist Space Resolution and Space Distribution of Ionic Species
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) : Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions
- Photo-Induced Reaction Dynamics in Poly (di-n-hexylsilylene) by Excimer Laser Flash Photolysis
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- The pH-Dependent Changes of Intramolecular Electron Transfer on Copper-Containing Nitrite Reductase
- Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation
- Inclusion Complexation of 4-Biphenylcarboxylate, 4-Biphenylacetate, and 4-Biphenylsulfonate with α-Cyclodextrin, Studied by Pulse Radiolysis
- Determination of Association Constants for Cyclodextrin Inclusion Complexation by Pulse Radiolysis
- Radical Cation of Dodecamethylcyclohexagermane Generated by Pulse Radiolysis
- Radical Anions of Oligogermanes, Me(Me_2Ge)_nMe(n=2, 3, 5, and 10)Generated by Pulse Radiolysis
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures
- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
- Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film
- Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
- Delocalization of Positive and Negative Charge Carriers on Oligo- and Poly-fluorenes Studied by Low-Temperature Matrix Isolation Technique
- Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography
- Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness
- Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography
- Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists
- Negative Resist Material Based on Polysilanes for Electron Beam and X-Ray Lithographies
- Thermal Dehydration of a Poly(vinyl alcohol) Film Promoted by Diphenyliodonium Trifluoromethanesulfonate : Absorption Spectra and Elemental Analysis Results
- Promotion of Thermal Dehydration of Poly(vinyl alcohol) Film by Diphenyliodonium Salt
- Activation of SoxR-Dependent Transcription in Pseudomonas aeruginosa
- Noise Analysis of Si-Based Planar-Type Ion-Channel Biosensors
- Si-Based Planer Type Ion-channel Biosensors
- Optimum Dissolution Point of Chemically Amplified Resists in Terms of Trade-Off Relationships between Resolution, Line Edge Roughness, and Sensitivity
- Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation
- Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Effects of Flare on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-Wafer Surface
- Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies
- Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation
- Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons
- Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Radiolysis of CFC-113 Adsorbed on a Molecular Sieve
- Formation of Conjugated Double Bonds in Poly(vinyl alcohol) Film under Irradiation with γ-Rays at Elevated Temperature
- Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
- Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films
- Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Noise Analysis of Si-Based Planar-Type Ion-Channel Biosensors
- Formation of Nanowires Based on $\pi$-Conjugated Polymers by High-Energy Ion Beam Irradiation
- Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
- Reductive Dechlorination of α,ω-Dichloroalkanes Adsorbed on Molecular Sieve 13X
- Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist
- Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists
- Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication
- Radiolytic and Thermal Dehalogenation of CFC-113 Adsorbed on Molecular Sieve 13X
- Scanning Tunneling Microscopy Profiling of Steep Ridges Using Metal-Coated Carbon Nanotube Tip
- Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography
- Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
- Dynamics of Radical Cation of Poly(4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists
- Theoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists
- Side Wall Degradation of Chemically Amplified Resists Based on Poly(4-hydroxystyrene) for Extreme Ultraviolet Lithography
- Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists
- Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- Acid Generation Mechanism for Extreme Ultraviolet Resists Containing Pinanediol Monosulfonate Acid Amplifiers: A Pulse Radiolysis Study
- Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists
- Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices
- Effects of Polymer Interference during Acid Generation on Latent Image Quality of Extreme Ultraviolet Resists
- Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists
- Experimental Studies of Transverse and Longitudinal Beam Dynamics in Photoinjector
- Radiation Chemistry in Chemically Amplified Resists
- Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
- Study of Acid-Base Equilibrium in Chemically Amplified Resist
- Correlation between $C_{37}$ Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam
- Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation
- Full-dimensional Sampling and Analysis of BSSRDF
- Study of Interrelation Between Reaction of Polymer-Bound/Blend Photoacid Generator with Solvated Electron and Acid Generation Efficiency
- Study of Interrelation Between Reaction of Polymer-Bound/Blend Photoacid Generator with Solvated Electron and Acid Generation Efficiency (Special Issue : Microprocesses and Nanotechnology)
- High-Absorption Resist Process for Extreme Ultraviolet Lithography
- Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography
- Full-dimensional Sampling and Analysis of BSSRDF
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography