Reaction Mechanisms of Brominated Chemically Amplified Resists
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概要
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Poly(4-hydroxystyrene) (PHS) and its derivatives are widely-used base polymers for chemically amplified resists. Halogenation of polymers is a popular strategy to improve resist performance. However, the reaction mechanisms for halogenated PHS have not been investigated. We investigated the reaction mechanisms for brominated PHS from the viewpoint of acid generation. We found that brominated PHS without acid generators can produce acids with 55% efficiency compared with PHS with 3.1 mol % (10 wt %) triphenylsulfonium triflate. The acid yield of brominated PHS was twice that of poly(4-bromostyrene).
- 2005-06-10
著者
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Komano Hiroji
Tokyo Ohka Kogyo Co. Ltd.
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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