Radical Anions of Oligogermanes, Me(Me_2Ge)_nMe(n=2, 3, 5, and 10)Generated by Pulse Radiolysis
スポンサーリンク
概要
著者
-
TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
-
吉田 陽一
阪大産研
-
Seki S
Osaka Univ. Osaka
-
Seki Shuhei
The Institute Of Scientific And Industrial Research Osaka University
-
Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
-
Tagawa Seiichi
The Institute Of Scientific And Industrial Research
-
Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
-
MOCHIDA Kunio
Department of Chemistry, Faculty of Science, Gakusyuin University
-
YOSHIDA Yohichi
The Institute of Scientific and Industrial Research, Osaka University
-
HATA Rieko
Department of Chemistry, Faculty of Science, Gakushuin University
-
CHIBA Hiromi
Department of Chemistry, Faculty of Science, Gakushuin University
-
Hata R
Department Of Chemistry Faculty Of Science Gakushuin University
-
Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
-
Chiba Hiromi
Department Of Chemistry College Of Humanities And Sciences Nihon University
-
Chiba Hiromi
Department Of Chemistry Faculty Of Science Gakushuin University
-
Mochida K
Department Of Chemistry Faculty Of Science Gakushuin University
-
Mochida Kunio
Department Of Chemistry Faculty Of Science Gakushuin University
関連論文
- Preparation of Poly(γ-glutamic acid) Hydrogel / Apatite Composites and Their Application for Scaffold of Cell Proliferation
- 22pTJ-15 アト秒電子バンチの集団的エネルギー損失のシミュレーション(22pTJ 領域2,ビーム物理領域合同(レーザープラズマ加速・高エネルギー密度プラズマ物理),領域2(プラズマ基礎・プラズマ科学・核融合プラズマ・プラズマ宇宙物理))
- 22pTJ-15 アト秒電子バンチの集団的エネルギー損失のシミュレーション(22pTJ 領域2,ビーム物理領域合同(レーザープラズマ加速・高エネルギー密度プラズマ物理),ビーム物理領域)
- 23aZL-8 医療応用を目指したフォトカソード電子銃における電子ビームの光変調(ビームダイナミクス,ビーム源,ビーム物理領域)
- 28pSH-6 フォトニック結晶による可視域放射光の発生
- 27p-H-11 連続電子パンチによるプラズマウェーク場の蓄積効果
- 27p-H-10 東大電子ライナックにおけるプラズマレンズ実験
- 29a-PS-149 レーザーフォトカソードRF電子銃の製作と性能試験
- Pulse Radiolysis of Hexameric Nitrite Reductase Containing Two Type 1 Cu Sites in a Monomer
- The Intramolecular Electron Transfer between the Type 1 Cu and the Type 2 Cu in a Mutant of Hyphomicrobium Nitrite Reductase
- Experimental Studies of Transverse and Longitudinal Beam Dynamics in Photoinjector
- Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
- Nanowire Formation and Selective Adhesion on Substrates by Single-Ion Track Reaction in Polysilanes
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) : Relation between Resist Space Resolution and Space Distribution of Ionic Species
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) : Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions
- Pulse Radiolysis Studies on Radiation Damage of DNA
- パルスラジオリシス法によるユウロピウム(III)-アミノポリカルボン酸錯体の酸化還元反応の研究
- Photo-Induced Reaction Dynamics in Poly (di-n-hexylsilylene) by Excimer Laser Flash Photolysis
- 6p-YC-3 有機凝縮系のパルスラジオリシス : ジェミネートイオン再結合過程
- Positive-Negative Inversion of Silicon Based Resist Materials:Poly(di-n-hexylsilane)for Ion Beam Irradiation
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- ジェミネート再結合過程および初期空間分布に関する研究
- Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography
- Study of Radiation-Induced Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography
- The pH-Dependent Changes of Intramolecular Electron Transfer on Copper-Containing Nitrite Reductase
- Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation
- Inclusion Complexation of 4-Biphenylcarboxylate, 4-Biphenylacetate, and 4-Biphenylsulfonate with α-Cyclodextrin, Studied by Pulse Radiolysis
- Determination of Association Constants for Cyclodextrin Inclusion Complexation by Pulse Radiolysis
- Transient Species Induced in X-ray Chemically Amplified Positive Resists:Post-Exposure Delay Effect
- Effects of Impurities on Processes of Acid Generation in Chemically Amplified Resists for Electron Beam and X-Ray Lithography
- Radical Cation of Dodecamethylcyclohexagermane Generated by Pulse Radiolysis
- Radical Anions of Oligogermanes, Me(Me_2Ge)_nMe(n=2, 3, 5, and 10)Generated by Pulse Radiolysis
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures
- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
- Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film
- Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
- Delocalization of Positive and Negative Charge Carriers on Oligo- and Poly-fluorenes Studied by Low-Temperature Matrix Isolation Technique
- Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
- Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography
- Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists
- Formation of isolated ultrafine optical nanofibers by single particle nanofabrication technique
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography
- Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness
- Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists
- Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography
- Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists
- フェムト秒・アト秒の放射線化学 (特集 加速器を利用した化学・生物学・医学の最先端)
- Negative Resist Material Based on Polysilanes for Electron Beam and X-Ray Lithographies
- Thermal Dehydration of a Poly(vinyl alcohol) Film Promoted by Diphenyliodonium Trifluoromethanesulfonate : Absorption Spectra and Elemental Analysis Results
- Promotion of Thermal Dehydration of Poly(vinyl alcohol) Film by Diphenyliodonium Salt
- Activation of SoxR-Dependent Transcription in Pseudomonas aeruginosa
- Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation
- Theoretical Study on Difference between Image Quality Formed in Low- and High-Activation-Energy Chemically Amplified Resists
- Noise Analysis of Si-Based Planar-Type Ion-Channel Biosensors
- Si-Based Planer Type Ion-channel Biosensors
- Optimum Dissolution Point of Chemically Amplified Resists in Terms of Trade-Off Relationships between Resolution, Line Edge Roughness, and Sensitivity
- Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists
- Formation of hybrid nano-structures by ion beam irradiation to the sol-gel film
- Formation of Nanowires Based on π-Conjugated Polymers by High-Energy Ion Beam Irradiation
- 157-nm-Induced Resist Outgassing Studied by Film Thickness Loss and In-Situ Quadrupole Mass Spectrometry
- Dynamics of Silylenes in Polysilylenes with Structural Defects by Excimer Laser Flash Photolysis
- Electronic Structure of Polysilanes Studies by Femtosecond Laser Flash Photolysis
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- 25pGAB-4 不純物半導体からのコヒーレントTHz単色チェレンコフ放射(25pGAB 放射光・X線源・テラヘルツ光,ビーム物理領域)
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation
- Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Effects of Flare on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-Wafer Surface
- Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies
- Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation
- Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons
- Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Radiolysis of CFC-113 Adsorbed on a Molecular Sieve
- Formation of Conjugated Double Bonds in Poly(vinyl alcohol) Film under Irradiation with γ-Rays at Elevated Temperature
- Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
- Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films
- Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Noise Analysis of Si-Based Planar-Type Ion-Channel Biosensors
- Formation of Nanowires Based on $\pi$-Conjugated Polymers by High-Energy Ion Beam Irradiation
- Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
- 27pGB-8 コヒーレントチェレンコフ放射を用いた多モードTHz発生の研究(27pGB 超高強度レーザー・レーザープラズマ加速・THz発生,ビーム物理領域)
- 30aSA-5 アト秒電子線パルスの発生と応用展開(30aSA ビーム物理領域,領域1,領域2合同シンポジウム:フェムト秒・アト秒電子ビームの生成・測定・応用,領域1(原子分子・量子エレクトロニクス・放射線))