Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
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概要
- 論文の詳細を見る
In chemically amplified resists for ionizing radiations such as electron beams and extreme ultraviolet (EUV), low-energy electrons play an important role in the pattern formation processes. The reactivity of acid generators with low-energy electrons was evaluated using solvated electrons in tetrahydrofuran, which were generated by a pulsed electron beam. The rate constants of acid generators with the solvated electrons ranged from 0.6 to $1.9 \times 10^{11}$ M-1 s-1.
- 2006-02-25
著者
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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KAI Toshiyuki
JSR Corp.
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SHIMOKAWA Tsutomu
JSR Corp.
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Wishart James
Chemistry Department Brookhaven National Laboratory
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Szreder Tomasz
Chemistry Department Brookhaven National Laboratory
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Wishart James
Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973-5000, U.S.A.
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