KAI Toshiyuki | JSR Corp.
スポンサーリンク
概要
関連著者
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KAI Toshiyuki
JSR Corp.
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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SHIMOKAWA Tsutomu
JSR Corp.
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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関 修平
大阪大学産業科学研究所
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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Hirose Ryo
The Institute Of Scientific And Industrial Research Osaka University
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Tagawa S
Osaka Univ. Osaka Jpn
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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古沢 孝弘
Osaka University
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NEMOTO Hiroaki
JSR Corp.
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Wishart James
Chemistry Department Brookhaven National Laboratory
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Szreder Tomasz
Chemistry Department Brookhaven National Laboratory
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田川 精一
阪大産研
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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YAMAMOTO Yukio
The Institute of Scientific and Industrial Research, Osaka University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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HIROSE Ryo
The Institute of Scientific and Industrial Research, Osaka University
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Yamamoto Yasuo
The Institute Of Scientific And Industrial Research Osaka University
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SHIGAKI Takumi
The Institute of Scientific and Industrial Research, Osaka University
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Shigaki Takumi
The Institute Of Scientific And Industrial Research Osaka University
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SZREDER Tomasz
Chemistry Department, Brookhaven National Laboratory
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Natsuda Kenichiro
The Institute Of Scientific And Industrial Research Osaka University
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Yamamoto Yukio
The Institute Of Scientific And Industrial Research Osaka University
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Kozawa Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Shimizu Daisuke
JSR Corp., 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
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Kozawa Takahiro
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Shigaki Takumi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Hirose Ryo
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Shimokawa Tsutomu
JSR Corp., 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
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Nemoto Hiroaki
JSR Corp., 100, Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
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Saeki Akinori
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Wishart James
Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973-5000, U.S.A.
著作論文
- Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation
- Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons
- Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist
- Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography