Kozawa Takahiro | The Institute Of Scientific And Industrial Research Osaka University
スポンサーリンク
概要
関連著者
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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関 修平
大阪大学産業科学研究所
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古沢 孝弘
Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa S
Osaka Univ. Osaka Jpn
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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Saeki Akinori
Osaka Univ. Osaka Jpn
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吉田 陽一
阪大産研
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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SHIMOKAWA Tsutomu
JSR Corp.
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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田川 精一
阪大産研
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Seki Shu
The Institute Of Scientific And Industrial Research
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Seki S
Osaka Univ. Osaka
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Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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KAI Toshiyuki
JSR Corp.
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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Yamashita Yoshio
Department Of Physics Tokai University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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YABASHI Makina
RIKEN
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OHASHI Haruhiko
Japan Synchrotron Radiation Research Institute
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YUKAWA Hiroto
Tokyo Ohka Kogyo Co., Ltd.
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ONODERA Junichi
Tokyo Ohka Kogyo Co., Ltd.
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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KIMURA Hiroaki
Japan Synchrotron Radiation Research Institute
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Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
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SHIGAKI Takumi
The Institute of Scientific and Industrial Research, Osaka University
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Shigaki Takumi
The Institute Of Scientific And Industrial Research Osaka University
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Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
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Nagasono Mitsuru
Riken Xfel Project Head Office
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Kameshima Takashi
Riken
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Onodera Junichi
Tokyo Ohka Kogyo Co. Ltd.
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Senba Yasunori
Japan Synchrotron Radiation Res. Inst. Hyogo Jpn
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OKAMOTO Kazumasa
Faculty of Engineering, Hokkaido University
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OIKAWA Keita
Faculty of Engineering, Hokkaido University
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HATSUI Takaki
RIKEN Harima Institute
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TOGASHI Tadashi
Japan Synchrotron Radiation Research Institute
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TONO Kensuke
Japan Synchrotron Radiation Research Institute
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FUJIYOSHI Ryoko
Faculty of Engineering, Hokkaido University
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SUMIYOSHI Takashi
Faculty of Engineering, Hokkaido University
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Kozawa Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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NAGASONO Mitsuru
RIKEN Harima Institute
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TSUKUDA Satoshi
The Institute of Scientific and Industrial Research, Osaka University
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SUGIMOTO Masaki
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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TANAKA Shigeru
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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MATSUI Yoshinori
The Institute of Scientific and Industrial Research, Osaka University
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NAGAHARA Seiji
The Institute of Scientific and Industrial Research, Osaka University
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YAMASHITA Yoshio
SORTEC Corporation
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TAGUCHI Takao
SORTEC Corporation
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Takei Satoshi
Nissan Chemical Ind. Ltd. Toyama Jpn
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Takei Satoshi
Nissan Chemical Industries Ltd.
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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SENBA Yasunori
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Res. Inst. (jasri) Hyogo Jpn
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute (jasri)
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FUKUYAMA Takehiro
The Institute of Scientific and Industrial Research, Osaka University
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TAKASU Ryoichi
Tokyo Ohka Kogyo Co., Ltd.
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KOGANESAWA Tomoyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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HORIE Kazuyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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HIJIKATA Hayato
The Institute of Scientific and Industrial Research, Osaka University
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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Yamaguchi Yoh-ichi
Hoya Corporation
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Matsui Yoshinori
The Institute Of Scientific And Industrial Research Osaka University
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Santillan Julius
Semiconductor Leading Edge Technologies Inc.
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NAKAMURA Jun
The Institute of Scientific and Industrial Research, Osaka University
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FURUKAWA Kikuo
Mitsubishi Gas Chemical Co., Inc.
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SUGAWARA Hidekazu
The Institute of Scientific and Industrial Research, Osaka University
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HIROSE Ryo
The Institute of Scientific and Industrial Research, Osaka University
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Sugawara Hidekazu
The Institute Of Scientific And Industrial Research Osaka University
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ANDO Tomoyuki
Tokyo Ohka Kogyo Co., Ltd.
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KOMANO Hiroji
Tokyo Ohka Kogyo Co., Ltd.
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Hirose Ryo
The Institute Of Scientific And Industrial Research Osaka University
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Wishart James
Chemistry Department Brookhaven National Laboratory
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Taguchi T
Department Of Electrical And Electronic Engineering Yamaguchi University
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Takei Satoshi
Nissan Chemical Inst. Ltd. Chiba Jpn
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
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Nagahara S
Nec Electronics Corp. Kanagawa Jpn
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Toriumi Minoru
Semiconductor Leading Edge Technologies Inc.(selete)
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Takasu Ryoichi
Tokyo Ohka Kogyo Co. Ltd.
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Hijikata Hayato
The Institute Of Scientific And Industrial Research Osaka University
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SZREDER Tomasz
Chemistry Department, Brookhaven National Laboratory
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Szreder Tomasz
Chemistry Department Brookhaven National Laboratory
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NATSUDA Kenichiro
The Institute of Scientific and Industrial Research, Osaka University
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Komano Hiroji
Tokyo Ohka Kogyo Co. Ltd.
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Natsuda Kenichiro
The Institute Of Scientific And Industrial Research Osaka University
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Fukuyama Takehiro
The Institute Of Scientific And Industrial Research Osaka University
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Oizumi Hiroaki
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Furukawa Kikuo
Mitsubishi Gas Chemical Co. Inc.
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Itani Toshiro
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Nakamura Jun
The Institute Of Scientific And Industrial Research Osaka University
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Itani Toshiro
Euvl Infrastructure Development Center Inc.
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Tanaka Shigeru
Takasaki Radiation Chemistry Research Establishment Japan Atomic Energy Research Institute
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. Ibaraki Jpn
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Santillan Julius
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Itani Toshiro
Euvl Infrastructure Development Center Inc. (eidec)
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Santillan Julius
Euvl Infrastructure Development Center Inc. (eidec)
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YABASHI Makina
RIKEN Harima Institute
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Yabashi Makina
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Hatsui Takaki
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Kimura Hiroaki
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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KAMESHIMA Takashi
RIKEN Harima Institute
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Kameshima Takashi
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Ohashi Haruhiko
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Nagasono Mitsuru
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Fujiyoshi Ryoko
Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan
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Togashi Tadashi
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Senba Yasunori
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Tono Kensuke
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Oikawa Keita
Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan
著作論文
- Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
- Nanowire Formation and Selective Adhesion on Substrates by Single-Ion Track Reaction in Polysilanes
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) : Relation between Resist Space Resolution and Space Distribution of Ionic Species
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) : Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film
- Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
- Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography
- Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness
- Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Theoretical Study on Difference between Image Quality Formed in Low- and High-Activation-Energy Chemically Amplified Resists
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Normalized Image Log Slope with Secondary Electron Migration Effect in Chemically Amplified Extreme Ultraviolet Resists
- Wavelength Dependence of Lithography Resolution in Extreme Ultraviolet Region
- Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
- Effect of Ultrahigh-Density lonization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
- Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator