Saeki Akinori | The Institute Of Scientific And Industrial Research Osaka University

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概要

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著作論文

Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) : Relation between Resist Space Resolution and Space Distribution of Ionic Species
Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) : Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions
Charge Transport Properties of Hexabenzocoronene Nanotubes by Field Effect : Influence of the Oligoether Side Chains on the Mobility
Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
Difference of spur distribution in chemically amplified resists upon exposure to electron beam and extreme ultraviolet radiation
Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography
Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
Mobilities of Charge Carriers in Dendrite and Linear Oligogermanes by Flash Photolysis Time-resolved Microwave Conductivity Technique
Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
Delocalization of Positive and Negative Charge Carriers on Oligo- and Poly-fluorenes Studied by Low-Temperature Matrix Isolation Technique
Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists
Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons
Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
Correlation between $C_{37}$ Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam
Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

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