Okamoto K | The Institute Of Scientific And Industrial Research Osaka University
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概要
- OKAMOTO Kazumasaの詳細を見る
- 同名の論文著者
- The Institute Of Scientific And Industrial Research Osaka Universityの論文著者
関連著者
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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関 修平
大阪大学産業科学研究所
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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古沢 孝弘
Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa S
Osaka Univ. Osaka Jpn
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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Saeki Akinori
Osaka Univ. Osaka Jpn
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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SHIMOKAWA Tsutomu
JSR Corp.
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田川 精一
阪大産研
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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SHIGAKI Takumi
The Institute of Scientific and Industrial Research, Osaka University
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Shigaki Takumi
The Institute Of Scientific And Industrial Research Osaka University
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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吉田 陽一
阪大産研
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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NAKAMURA Jun
The Institute of Scientific and Industrial Research, Osaka University
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KAI Toshiyuki
JSR Corp.
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ANDO Tomoyuki
Tokyo Ohka Kogyo Co., Ltd.
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KOMANO Hiroji
Tokyo Ohka Kogyo Co., Ltd.
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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NATSUDA Kenichiro
The Institute of Scientific and Industrial Research, Osaka University
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Komano Hiroji
Tokyo Ohka Kogyo Co. Ltd.
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Natsuda Kenichiro
The Institute Of Scientific And Industrial Research Osaka University
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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Yamashita Yoshio
Department Of Physics Tokai University
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Nakamura Jun
The Institute Of Scientific And Industrial Research Osaka University
著作論文
- Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
- Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness
- Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography