KOZAWA Takahiro | The Institute of Scientific and Industrial Research (ISIR), Osaka University
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概要
- KOZAWA Takahiroの詳細を見る
- 同名の論文著者
- The Institute of Scientific and Industrial Research (ISIR), Osaka Universityの論文著者
関連著者
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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古沢 孝弘
Osaka University
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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関 修平
大阪大学産業科学研究所
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Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa S
Osaka Univ. Osaka Jpn
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Kozawa Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KAI Toshiyuki
JSR Corp.
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SHIMOKAWA Tsutomu
JSR Corp.
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Oizumi Hiroaki
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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Komano Hiroji
Tokyo Ohka Kogyo Co. Ltd.
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Saeki Akinori
Osaka Univ. Osaka Jpn
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Natsuda Kenichiro
The Institute Of Scientific And Industrial Research Osaka University
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吉田 陽一
阪大産研
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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Onodera Junichi
Tokyo Ohka Kogyo Co. Ltd.
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Santillan Julius
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Seiichi Tagawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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田川 精一
阪大産研
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Seki Shu
The Institute Of Scientific And Industrial Research
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YUKAWA Hiroto
Tokyo Ohka Kogyo Co., Ltd.
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Santillan Julius
Semiconductor Leading Edge Technologies Inc.
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Yamashita Yoshio
Department Of Physics Tokai University
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Tagawa Seiichi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Kozawa Takahiro
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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YABASHI Makina
RIKEN
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Seki S
Osaka Univ. Osaka
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Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
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OHASHI Haruhiko
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Res. Inst. (jasri) Hyogo Jpn
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ONODERA Junichi
Tokyo Ohka Kogyo Co., Ltd.
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KOGANESAWA Tomoyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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HORIE Kazuyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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KIMURA Hiroaki
Japan Synchrotron Radiation Research Institute
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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Hirose Ryo
The Institute Of Scientific And Industrial Research Osaka University
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Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
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Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
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Wishart James
Chemistry Department Brookhaven National Laboratory
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Toriumi Minoru
Semiconductor Leading Edge Technologies Inc.(selete)
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Shigaki Takumi
The Institute Of Scientific And Industrial Research Osaka University
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Nagasono Mitsuru
Riken Xfel Project Head Office
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Szreder Tomasz
Chemistry Department Brookhaven National Laboratory
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Kameshima Takashi
Riken
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Fukuyama Takehiro
The Institute Of Scientific And Industrial Research Osaka University
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Senba Yasunori
Japan Synchrotron Radiation Res. Inst. Hyogo Jpn
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Yamamoto Yukio
The Institute Of Scientific And Industrial Research Osaka University
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OKAMOTO Kazumasa
Faculty of Engineering, Hokkaido University
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OIKAWA Keita
Faculty of Engineering, Hokkaido University
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HATSUI Takaki
RIKEN Harima Institute
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TOGASHI Tadashi
Japan Synchrotron Radiation Research Institute
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TONO Kensuke
Japan Synchrotron Radiation Research Institute
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FUJIYOSHI Ryoko
Faculty of Engineering, Hokkaido University
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SUMIYOSHI Takashi
Faculty of Engineering, Hokkaido University
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Toshiro Itani
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Santillan Julius
EUVL Infrastructure Development Center, Inc. (EIDEC), Tsukuba, Ibaraki 305-8569, Japan
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Mimura Takeyoshi
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Koza, Kanagawa 253-0114, Japan
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NAGASONO Mitsuru
RIKEN Harima Institute
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Kozawa Takahiro
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Utsumi Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Kanagawa 253-0114, Japan
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Mimura Takeyoshi
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Kanagawa 253-0114, Japan
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Komano Hiroji
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Koza, Kanagawa 253-0114, Japan
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Okamoto Kazumasa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Ohmori Katsumi
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Koza, Kanagawa 253-0114, Japan
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Tanaka Masafumi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Shell Melissa
Intel Corporation, Hillsboro, OR 97124, U.S.A.
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Itani Toshiro
EUVL Infrastructure Development Center, Inc. (EIDEC), Tsukuba, Ibaraki 305-8569, Japan
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Ohomori Katsumi
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan
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TSUKUDA Satoshi
The Institute of Scientific and Industrial Research, Osaka University
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SUGIMOTO Masaki
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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MATSUI Yoshinori
The Institute of Scientific and Industrial Research, Osaka University
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NAGAHARA Seiji
The Institute of Scientific and Industrial Research, Osaka University
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YAMASHITA Yoshio
SORTEC Corporation
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TAGUCHI Takao
SORTEC Corporation
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Arimitsu Koji
Department Of Pure And Applied Chemistry Faculty Of Science And Technology Tokyo University Of Scien
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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SENBA Yasunori
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute (jasri)
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FUKUYAMA Takehiro
The Institute of Scientific and Industrial Research, Osaka University
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TAKASU Ryoichi
Tokyo Ohka Kogyo Co., Ltd.
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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Yamaguchi Yoh-ichi
Hoya Corporation
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Matsui Yoshinori
The Institute Of Scientific And Industrial Research Osaka University
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FURUKAWA Kikuo
Mitsubishi Gas Chemical Co., Inc.
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SUGAWARA Hidekazu
The Institute of Scientific and Industrial Research, Osaka University
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CAO Heidi
Intel Corporation
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DENG Hai
Intel Corporation
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LEESON Michael
Intel Corporation
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Sugawara Hidekazu
The Institute Of Scientific And Industrial Research Osaka University
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NEMOTO Hiroaki
JSR Corp.
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ANDO Tomoyuki
Tokyo Ohka Kogyo Co., Ltd.
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KOMANO Hiroji
Tokyo Ohka Kogyo Co., Ltd.
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TAGAWA Seiichi
Tokyo Ohka Kogyo Co., Ltd.
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Taguchi T
Department Of Electrical And Electronic Engineering Yamaguchi University
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
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Nagahara S
Nec Electronics Corp. Kanagawa Jpn
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SHIGAKI Takumi
The Institute of Scientific and Industrial Research, Osaka University
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Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
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Idesaki Akira
Takasaki Radiation Chemistry Institute Japan Atomic Energy Research Laboratories
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Takasu Ryoichi
Tokyo Ohka Kogyo Co. Ltd.
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SZREDER Tomasz
Chemistry Department, Brookhaven National Laboratory
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NATSUDA Kenichiro
The Institute of Scientific and Industrial Research, Osaka University
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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Furukawa Kikuo
Mitsubishi Gas Chemical Co. Inc.
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Itani Toshiro
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Tanaka Shigeru
Takasaki Radiation Chemistry Research Establishment Japan Atomic Energy Research Institute
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. Ibaraki Jpn
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Itani Toshiro
Euvl Infrastructure Development Center Inc. (eidec)
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Santillan Julius
Euvl Infrastructure Development Center Inc. (eidec)
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Cao Heidi
Intel Corporation, 5200 N.E. Elam Young Parkway, Hillsboro, Oregon 97124, U.S.A.
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YABASHI Makina
RIKEN Harima Institute
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Yabashi Makina
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Hatsui Takaki
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ando Tomoyuki
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Koza, Kanagawa 253-0114, Japan
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Iwai Takeshi
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Kanagawa 253-0114, Japan
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Joshi Ravi
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Kimura Hiroaki
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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KAMESHIMA Takashi
RIKEN Harima Institute
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Kameshima Takashi
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Ohashi Haruhiko
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Ohnishi Ryuji
Nissan Chemical Industries, Ltd., 635 Sasakura, Fuchu, Toyama 939-2792, Japan
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Endo Takafumi
Nissan Chemical Industries, Ltd., 635 Sasakura, Fuchu, Toyama 939-2792, Japan
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Sakamoto Rikimaru
Nissan Chemical Industries, Ltd., 635 Sasakura, Fuchu, Toyama 939-2792, Japan
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Shimizu Daisuke
JSR Corp., 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
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Arimitsu Koji
Department of Pure and Applied Chemistry, Tokyo University of Science, Noda, Chiba 278-8510, Japan
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Nagasono Mitsuru
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Shigaki Takumi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Enomoto Kazuyuki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Seki Shu
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Sugimoto Masaki
Takasaki Radiation Chemistry Institute, Japan Atomic Energy Research Laboratories, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan
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Fujiyoshi Ryoko
Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan
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Irie Makiko
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Kanagawa 253-0114, Japan
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Togashi Tadashi
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Hirose Ryo
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Shimokawa Tsutomu
JSR Corp., 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
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Yamamoto Yukio
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Nemoto Hiroaki
JSR Corp., 100, Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
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Fukuyama Takehiro
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Komano Hiroji
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Koza, Kanagawa 253-0114, Japan
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Oshima Akihiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Sato Mitsuru
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Koza, Kanagawa 253-0114, Japan
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Saeki Akinori
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Saeki Akinori
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Ohmori Katsumi
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Koza, Kanagawa 253-0114, Japan
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Tanaka Masafumi
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Idesaki Akira
Takasaki Radiation Chemistry Institute, Japan Atomic Energy Research Laboratories, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan
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Yukawa Hiroto
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Koza, Kanagawa 253-0114, Japan
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Nakano Atsuro
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Senba Yasunori
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Toriumi Minoru
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Takahiro Kozawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Erdmann Andreas
Fraunhofer IISB
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Tono Kensuke
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Oikawa Keita
Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan
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Onodera Junichi
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Koza, Kanagawa 253-0114, Japan
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Ikeda Sadatatsu
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Komuro Yoshitaka
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Yoshizawa Atsutaro
Department of Pure and Applied Chemistry, Tokyo University of Science, Noda, Chiba 278-8510, Japan
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Wishart James
Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973-5000, U.S.A.
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Utsumi Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan
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Leeson Michael
Intel Corporation, 5200 N.E. Elam Young Parkway, Hillsboro, Oregon 97124, U.S.A.
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KOMURO Yoshitaka
The Institute of Scientific and Industrial Research, Osaka University
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Itani Toshiro
EUVL Infrastructure Development Center, Inc., Tsukuba, Ibaraki 305-8569, Japan
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OHOMORI Katsumi
Tokyo Ohka Kogyo Co., Ltd.
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UTSUMI Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd.
著作論文
- Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) : Relation between Resist Space Resolution and Space Distribution of Ionic Species
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) : Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
- Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Optimum Dissolution Point of Chemically Amplified Resists in Terms of Trade-Off Relationships between Resolution, Line Edge Roughness, and Sensitivity
- Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists
- Thermalization Distance of Electrons Generated in Poly(4-hydroxystyrene) Film Containing Acid Generator upon Exposure to Extreme Ultraviolet Radiation
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- Relationship of Electron Diffusion Length to Line Edge Roughness in Chemically Amplified Extreme Ultraviolet Resists
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation
- Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Effects of Flare on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies
- Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation
- Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons
- Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
- Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films
- Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Proton Dynamics in Chemically Amplified Electron Beam Resists
- Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
- Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist
- Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists
- Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication
- Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography
- Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
- Dynamics of Radical Cation of Poly(4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists
- Theoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists
- Side Wall Degradation of Chemically Amplified Resists Based on Poly(4-hydroxystyrene) for Extreme Ultraviolet Lithography
- Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists
- Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists
- Resist Properties Required for 6.67nm Extreme Ultraviolet Lithography
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
- Acid Generation Mechanism for Extreme Ultraviolet Resists Containing Pinanediol Monosulfonate Acid Amplifiers: A Pulse Radiolysis Study
- Resist Materials and Processes for Extreme Ultraviolet Lithography
- Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography
- Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator
- Effect of Ultrahigh-Density lonization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
- Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator
- Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists
- Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices
- Effects of Polymer Interference during Acid Generation on Latent Image Quality of Extreme Ultraviolet Resists
- Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists
- Radiation Chemistry in Chemically Amplified Resists
- Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
- Study of Acid-Base Equilibrium in Chemically Amplified Resist
- Correlation between $C_{37}$ Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam
- Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation
- Acid Diffusion Length in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography
- Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
- High-Absorption Resist Process for Extreme Ultraviolet Lithography
- Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography
- Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography
- Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model
- Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists
- Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography
- Effects of effective reaction radius for neutralization on performance of chemically amplified resists