Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-11-10
著者
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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関 修平
大阪大学産業科学研究所
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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SHIMOKAWA Tsutomu
JSR Corp.
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SHIGAKI Takumi
The Institute of Scientific and Industrial Research, Osaka University
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Shigaki Takumi
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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