Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2005-11-10

著者

• TAGAWA Seiichi

  The Institute of Scientific and Industrial Research, Osaka University

• 関 修平

  大阪大学産業科学研究所

• OKAMOTO Kazumasa

  The Institute of Scientific and Industrial Research, Osaka University

• KOZAWA Takahiro

  The Institute of Scientific and Industrial Research, Osaka University

• Tagawa Seiichi

  The Institute Of Scientific And Industrial Research

• Kozawa Takahiro

  The Institute Of Scientific And Industrial Research Osaka University

• YAMAMOTO Hiroki

  The Institute of Scientific and Industrial Research, Osaka University

• SHIMOKAWA Tsutomu

  JSR Corp.

• SHIGAKI Takumi

  The Institute of Scientific and Industrial Research, Osaka University

• Shigaki Takumi

  The Institute Of Scientific And Industrial Research Osaka University

• Okamoto K

  The Institute Of Scientific And Industrial Research Osaka University

• Okamoto Kazumasa

  The Institute Of Scientific And Industrial Research Osaka University

• Yamamoto Hiroki

  The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan

• KOZAWA Takahiro

  The Institute of Scientific and Industrial Research (ISIR), Osaka University

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