Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography
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概要
- 論文の詳細を見る
- 2005-07-30
著者
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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YAMAMOTO Yukio
The Institute of Scientific and Industrial Research, Osaka University
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KAI Toshiyuki
JSR Corp.
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Yamamoto Yasuo
The Institute Of Scientific And Industrial Research Osaka University
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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NEMOTO Hiroaki
JSR Corp.
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