Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2009-07-25
著者
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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関 修平
大阪大学産業科学研究所
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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Saeki Akinori
Osaka Univ. Osaka Jpn
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Tagawa S
Osaka Univ. Osaka Jpn
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古沢 孝弘
Osaka University
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