古沢 孝弘 | Osaka University
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概要
関連著者
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古沢 孝弘
Osaka University
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関 修平
大阪大学産業科学研究所
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa S
Osaka Univ. Osaka Jpn
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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田川 精一
阪大産研
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吉田 陽一
阪大産研
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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Saeki Akinori
The Institute Of Scientific And Industrial Research Osaka University
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Saeki Akinori
Osaka Univ. Osaka Jpn
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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Yamashita Yoshio
Department Of Physics Tokai University
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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KAI Toshiyuki
JSR Corp.
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SHIMOKAWA Tsutomu
JSR Corp.
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
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Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
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Itani Toshiro
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Seki Shu
The Institute Of Scientific And Industrial Research
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Seki S
Osaka Univ. Osaka
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KOZAWA Takahiro
Nuclear Engineering Research Laboratory, Faculty of Engineering, The University of Tokyo
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UESAKA Mitsuru
Nuclear Engineering Research Laboratory, Faculty of Engineering, The University of Tokyo
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Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
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YUKAWA Hiroto
Tokyo Ohka Kogyo Co., Ltd.
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ONODERA Junichi
Tokyo Ohka Kogyo Co., Ltd.
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UESAKA Mitsuru
The University of Tokyo
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
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Takei Satoshi
Nissan Chemical Inst. Ltd. Chiba Jpn
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Uesaka Mitsuru
Nuclear Engineering Res. Laboratory Of University Of Tokyo
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Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
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Uesaka M
The University Of Tokyo
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Kozawa Takahiro
Nuclear Engineering Reseach Laboratory Faculty Of Engineering University Of Tokyo
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Oizumi Hiroaki
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Onodera Junichi
Tokyo Ohka Kogyo Co. Ltd.
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. Ibaraki Jpn
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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黒田 隆之助
産業技術総合研究所
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小方 厚
阪大産研
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小方 厚
広大院先端物質
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石丸 毅
広大院先端
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阿達 正浩
広大院先端
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斉藤 直子
広大院先端
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古澤 孝弘
阪大産研
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鷲尾 方一
早大理工総研
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柏木 茂
早大理工総研
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黒田 隆之助
早大理工総研
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小林 利行
東大原工施
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阿達 正浩
分子研
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柏木 茂
阪大産研
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上坂 充
東京大学原子力専攻
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上田 徹
東大工
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柏木 茂
横浜国大教育
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上坂 充
東京大学工学部附属原子力工学研究施設
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上田 徹
東京大学大学院工学系研究科附属原子力工学研究施設
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上坂 充
東大 大学院工学系研究科 原子力工学研究施設
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TAGAWA Seiichi
ISIR, Osaka University
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KOBAYASHI Kazuo
ISIR, Osaka University
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KAWAMORI Takashi
ISIR, Osaka University
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KOZAWA Takahiro
ISIR, Osaka University
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YOSHIDA Yoichi
ISIR, Osaka University
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MATSUI Yoshinori
The Institute of Scientific and Industrial Research, Osaka University
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NAGAHARA Seiji
The Institute of Scientific and Industrial Research, Osaka University
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YAMASHITA Yoshio
SORTEC Corporation
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TAGUCHI Takao
SORTEC Corporation
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YOSHIDA Yoichi
Nuclear Engineering Research Laboratory, Faculty of Engineering, The University of Tokyo
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TAGAWA Seiichi
Research Center for Nuclear Science and Technology, The University of Tokyo
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Takei Satoshi
Nissan Chemical Ind. Ltd. Toyama Jpn
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Oshima Akihiro
Osaka Univ. Osaka Jpn
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宮 健三
東京大学工学部附属原子力工学研究施設
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古沢 孝弘
東京大学工学部附属原子力工学研究施設
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小林 利明
東京大学工学部附属原子力工学研究施設
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上田 徹
東京大学工学部附属原子力工学研究施設
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Takei Satoshi
Nissan Chemical Industries Ltd.
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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宮 健三
東京大学工学系研究科原子力工学研究施設
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誉田 義英
大阪大学産業科学研究所
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute
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Hirosawa Ichiro
Japan Synchrotron Radiation Res. Inst. (jasri) Hyogo Jpn
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Hirosawa Ichiro
Japan Synchrotron Radiation Research Institute (jasri)
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FUKUYAMA Takehiro
The Institute of Scientific and Industrial Research, Osaka University
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TAKASU Ryoichi
Tokyo Ohka Kogyo Co., Ltd.
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KOGANESAWA Tomoyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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HORIE Kazuyuki
Japan Synchrotron Radiation Research Institute (JASRI)
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HIJIKATA Hayato
The Institute of Scientific and Industrial Research, Osaka University
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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Yamaguchi Yoh-ichi
Hoya Corporation
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Matsui Yoshinori
The Institute Of Scientific And Industrial Research Osaka University
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NAKAMURA Jun
The Institute of Scientific and Industrial Research, Osaka University
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FURUKAWA Kikuo
Mitsubishi Gas Chemical Co., Inc.
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SUGAWARA Hidekazu
The Institute of Scientific and Industrial Research, Osaka University
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HIROSE Ryo
The Institute of Scientific and Industrial Research, Osaka University
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Sugawara Hidekazu
The Institute Of Scientific And Industrial Research Osaka University
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ANDO Tomoyuki
Tokyo Ohka Kogyo Co., Ltd.
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KOMANO Hiroji
Tokyo Ohka Kogyo Co., Ltd.
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Yamamoto Y
Osaka Univ. Osaka
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Hirose Ryo
The Institute Of Scientific And Industrial Research Osaka University
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Wishart James
Chemistry Department Brookhaven National Laboratory
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Taguchi T
Department Of Electrical And Electronic Engineering Yamaguchi University
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Nagahara S
Nec Electronics Corp. Kanagawa Jpn
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上坂 充
東京大学工学部
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Takasu Ryoichi
Tokyo Ohka Kogyo Co. Ltd.
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Hijikata Hayato
The Institute Of Scientific And Industrial Research Osaka University
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SZREDER Tomasz
Chemistry Department, Brookhaven National Laboratory
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Szreder Tomasz
Chemistry Department Brookhaven National Laboratory
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NATSUDA Kenichiro
The Institute of Scientific and Industrial Research, Osaka University
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Komano Hiroji
Tokyo Ohka Kogyo Co. Ltd.
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Natsuda Kenichiro
The Institute Of Scientific And Industrial Research Osaka University
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Fukuyama Takehiro
The Institute Of Scientific And Industrial Research Osaka University
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Furukawa Kikuo
Mitsubishi Gas Chemical Co. Inc.
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Takei Satoshi
Toyama Prefectural University
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SEKIGUCHI Atsushi
Toyama Prefectural University
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YANAMORI Naomi
Osaka University
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KASHIWAKURA Miki
Osaka University
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KOZAWA Takahiro
Osaka University
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TAGAWA Seiichi
Osaka University
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Nakamura Jun
The Institute Of Scientific And Industrial Research Osaka University
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Kobayashi Kazuo
Isir Osaka University
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Kozawa Takahiro
Osaka Univ. Osaka Jpn
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上坂 充
東京大学工学研究科原子力専攻
著作論文
- 28pSH-6 フォトニック結晶による可視域放射光の発生
- Effect of inhomogeneous acid distribution on line edge roughness- relationship to line edge roughness originating from chemical gradient
- Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) : Relation between Resist Space Resolution and Space Distribution of Ionic Species
- Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) : Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions
- Pulse Radiolysis Studies on Radiation Damage of DNA
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography
- 高輝度サブピコ秒電子シングルバンチの生成と利用
- Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation
- Effects of Impurities on Processes of Acid Generation in Chemically Amplified Resists for Electron Beam and X-Ray Lithography
- ナノ量子ビームによるナノ微細構造の創出と探索 (特集 大阪大学産業科学研究所 マテリアルインテグレーション--材料・生体・情報の融合を目指して(3))
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film
- Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography
- Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Sensitization distance and acid generation efficiency in a model system of chemically amplified electron beam resist with methacrylate backbone polymer
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Electron Dynamics in Chemically Amplified Resists
- Radiation Chemistry of Triphenylsulfonium Salts in EB and X-ray Chemically Amplified Resists-Proton Generation Mechanisms
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography
- Dissolution kinetics in chemically amplified EUV resist
- Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- Dissolution Kinetics in Polymer-Bound and Polymer-Blended Photo-Acid Generators
- Basic Aspects of Acid Generation Process in Chemically Amplified Electron Beam Resist