NAKANO Atsuro | The Institute of Scientific and Industrial Research, Osaka University
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概要
- Nakano Atsuroの詳細を見る
- 同名の論文著者
- The Institute of Scientific and Industrial Research, Osaka Universityの論文著者
関連著者
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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NAKANO Atsuro
The Institute of Scientific and Industrial Research, Osaka University
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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OKAMOTO Kazumasa
The Institute of Scientific and Industrial Research, Osaka University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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関 修平
大阪大学産業科学研究所
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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KAI Toshiyuki
JSR Corp.
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ANDO Tomoyuki
Tokyo Ohka Kogyo Co., Ltd.
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KOMANO Hiroji
Tokyo Ohka Kogyo Co., Ltd.
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Tagawa S
Osaka Univ. Osaka Jpn
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Nakano Atsuro
The Institute Of Scientific And Industrial Research Osaka University
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古沢 孝弘
Osaka University
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田川 精一
阪大産研
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YAMAMOTO Yukio
The Institute of Scientific and Industrial Research, Osaka University
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SHIMOKAWA Tsutomu
JSR Corp.
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Yamamoto Yasuo
The Institute Of Scientific And Industrial Research Osaka University
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Okamoto K
The Institute Of Scientific And Industrial Research Osaka University
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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Okamoto Kazumasa
The Institute Of Scientific And Industrial Research Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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NEMOTO Hiroaki
JSR Corp.
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TAGAWA Seiichi
Tokyo Ohka Kogyo Co., Ltd.
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Ando Tomoyuki
Tokyo Ohka Kogyo Co. Ltd.
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Wishart James
Chemistry Department Brookhaven National Laboratory
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SZREDER Tomasz
Chemistry Department, Brookhaven National Laboratory
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Szreder Tomasz
Chemistry Department Brookhaven National Laboratory
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Komano Hiroji
Tokyo Ohka Kogyo Co. Ltd.
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
著作論文
- Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)
- Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons
- Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography
- Proton Dynamics in Chemically Amplified Electron Beam Resists
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists