Seki S | Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
スポンサーリンク
概要
関連著者
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Seki S
Osaka Univ. Osaka
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Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
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Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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関 修平
大阪大学産業科学研究所
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Matsui Yoshinori
The Institute Of Scientific And Industrial Research Osaka University
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吉田 陽一
阪大産研
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Seki Shu
The Institute Of Scientific And Industrial Research
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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MATSUI Yoshihisa
Faculty of Life and Environmental Science, Shimane University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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MATSUI Yoshinori
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Tagawa S
Osaka Univ. Osaka Jpn
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Seki Shuhei
The Institute Of Scientific And Industrial Research Osaka University
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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SEKI Shu
Institute of Scientific and Industrial Research, Osaka University
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TAGAWA Seiichi
Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
Institute Of Scientific And Industrial Research Osaka University
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Tsuji Shinsuke
Department Of Chemistry Tokyo Institute Of Technology And Crest Japan Science And Technology Corpora
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MOCHIDA Kunio
Department of Chemistry, Faculty of Science, Gakusyuin University
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YOSHIDA Yohichi
The Institute of Scientific and Industrial Research, Osaka University
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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Tsuji Shou
Received August 21 2001; Cl-010821
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Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
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Mochida K
Department Of Chemistry Faculty Of Science Gakushuin University
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Mochida Kunio
Department Of Chemistry Faculty Of Science Gakushuin University
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Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
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Seki Shu
Institute Of Scientific And Industrial Research Osaka University
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Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
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古沢 孝弘
Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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田川 精一
阪大産研
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Umeda S
Hokkaido Univ. Sapporo Jpn
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TSUKUDA Satoshi
The Institute of Scientific and Industrial Research, Osaka University
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SUGIMOTO Masaki
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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TANAKA Shigeru
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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TSUJI Shou
The Institute of Scientific and Industrial Research, Osaka University
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NISHIDA Kazutaka
The Institute of Scientific and Industrial Research, Osaka University
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KANZAKI Kenichi
Institute of Scientific and Industrial Research, Osaka University
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YOSHIDA Yoichi
Institute of Scientific and Industrial Research, Osaka University
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SHIBATA Hiromi
Research Center for Nuclear Science and Technology, University of Tokyo
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ASAI Keisuke
Faculty of Engineering, University of Tokyo
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ISHIGURE Kenkichi
Faculty of Engineering, University of Tokyo
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Shibata Hiromi
Research Center For Nuclear Science And Technology The University Of Tokyo
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Umeda Satoshi
The Institute Of Scientific And Industrial Research Osaka University
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KUWANO Naoko
Department of Chemistry, Faculty of Science, Gakushuin University
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NAGAO Haruka
Department of Chemistry, Faculty of Science, Gakushuin University
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HATA Rieko
Department of Chemistry, Faculty of Science, Gakushuin University
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CHIBA Hiromi
Department of Chemistry, Faculty of Science, Gakushuin University
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ISHIKAWA Seiichi
Semiconductor Leading Edge Technolgies, Inc.
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Kanzaki Kenichi
Institute Of Scientific And Industrial Research Osaka University
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FURUKAWA Kikuo
Mitsubishi Gas Chemical Co., Inc.
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SUGAWARA Hidekazu
The Institute of Scientific and Industrial Research, Osaka University
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Sugawara Hidekazu
The Institute Of Scientific And Industrial Research Osaka University
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Hata R
Department Of Chemistry Faculty Of Science Gakushuin University
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Chiba Hiromi
Department Of Chemistry College Of Humanities And Sciences Nihon University
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Chiba Hiromi
Department Of Chemistry Faculty Of Science Gakushuin University
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Kuwano Naoko
Department Of Chemistry Faculty Of Science Gakushuin University
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Nagao Haruka
Department Of Chemistry Faculty Of Science Gakushuin University
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Ishigure Kenkichi
Faculty Of Engineering University Of Tokyo
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Ishikawa Seiichi
Semiconductor Leading Edge Technolgies Inc.
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SEKI Shu
Received August 21, 2001; CL-010821
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MATSUI Yoshinori
Received August 21, 2001; CL-010821
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TAGAWA Seiichi
Received August 21, 2001; CL-010821
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MATSUI Yoshinori
Institute of Scientific and Industrial Research, Osaka University
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IWAMOTO Toshiyuki
Institute of Scientific and Industrial Research, Osaka University
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Asai Keisuke
Faculty Of Electrical Engineering And Computer Science Yamanashi University
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Asai Keisuke
Faculty Of Engineering University Of Tokyo
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Nishida Kazutaka
The Institute Of Scientific And Industrial Research Osaka University
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Iwamoto Toshiyuki
Institute Of Scientific And Industrial Research Osaka University
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Furukawa Kikuo
Mitsubishi Gas Chemical Co. Inc.
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Tanaka Shigeru
Takasaki Radiation Chemistry Research Establishment Japan Atomic Energy Research Institute
著作論文
- Nanowire Formation and Selective Adhesion on Substrates by Single-Ion Track Reaction in Polysilanes
- Photo-Induced Reaction Dynamics in Poly (di-n-hexylsilylene) by Excimer Laser Flash Photolysis
- Positive-Negative Inversion of Silicon Based Resist Materials:Poly(di-n-hexylsilane)for Ion Beam Irradiation
- Radical Cation of Dodecamethylcyclohexagermane Generated by Pulse Radiolysis
- Radical Anions of Oligogermanes, Me(Me_2Ge)_nMe(n=2, 3, 5, and 10)Generated by Pulse Radiolysis
- Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures
- Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Formation of isolated ultrafine optical nanofibers by single particle nanofabrication technique
- Formation of hybrid nano-structures by ion beam irradiation to the sol-gel film
- 157-nm-Induced Resist Outgassing Studied by Film Thickness Loss and In-Situ Quadrupole Mass Spectrometry
- Dynamics of Silylenes in Polysilylenes with Structural Defects by Excimer Laser Flash Photolysis
- Electronic Structure of Polysilanes Studies by Femtosecond Laser Flash Photolysis