Itani Toshiro | Semiconductor Leading Edge Technol. Ibaraki Jpn
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概要
関連著者
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Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Oizumi Hiroaki
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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Santillan Julius
Semiconductor Leading Edge Technologies Inc.
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Toriumi Minoru
Semiconductor Leading Edge Technologies Inc.(selete)
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Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
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Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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関 修平
大阪大学産業科学研究所
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
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Itani Toshiro
Semiconductor Leading Edge Technologies Inc.
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Yamazaki Tamio
Semiconductor Leading Edge Technologies Inc.
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古沢 孝弘
Osaka University
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Seki Shu
The Institute Of Scientific And Industrial Research
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Seki S
Osaka Univ. Osaka
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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MATSUI Yoshinori
The Institute of Scientific and Industrial Research, Osaka University
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Seki S
Dep. Of Applied Chemistry Graduate School Of Engineering Osaka Univ.
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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ISHIKAWA Seiichi
Semiconductor Leading Edge Technolgies, Inc.
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Matsui Yoshinori
The Institute Of Scientific And Industrial Research Osaka University
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Itani T
Selete Tsukuba Jpn
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Seki Seiji
Department Of Chemistry Faculty Of Science Tohoku University
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Kudo Hiroto
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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Ishikawa Seiichi
Semiconductor Leading Edge Technolgies Inc.
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Nishikubo Tadatomi
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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Tagawa S
Osaka Univ. Osaka Jpn
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Furukawa Takamitsu
Semiconductor Leading Edge Technologies Inc. (selete)
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Itani Toshiro
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. Ibaraki Jpn
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Toshiro Itani
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Kaneyama Koji
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Watanabe Kunio
Semiconductor Leading Edge Technologies, Inc.
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Seiichi Tagawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Umeda S
Hokkaido Univ. Sapporo Jpn
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Umeda Satoshi
The Institute Of Scientific And Industrial Research Osaka University
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NAKATANI Kiyoharu
Department of Chemistry, Faculty of Science, hokkaido University
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Yamashita Jun
Department Of Biotechnology Faculty Of Engineering Kyoto Sangyo University
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SUGAWARA Hidekazu
The Institute of Scientific and Industrial Research, Osaka University
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Sugawara Hidekazu
The Institute Of Scientific And Industrial Research Osaka University
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Harada Tetsuo
Laboratory Of Environmental Physiology Faculty Of Education Kochi University
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Satou I
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Kudo Hiroto
Kanagawa Univ. Yokohama Jpn
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Irie S
Semiconductor Leading Edge Technologies Ibaraki Jpn
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Irie Shigeo
Semiconductor Leading Edge Technologies Inc. (selete)
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Takebe Yoko
Asahi Glass Co. Ltd.
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Okada Shinji
Asahi Glass Co. Ltd.
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SHINOZUKA Toyofumi
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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KAWAGUCHI Etsuro
Semiconductor Leading Edge Technologies, Inc. (Selete)
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FURUKAWA Takamitsu
Semiconductor Leading Edge Technologies, Inc. (Selete)
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SATOU Isao
Semiconductor Leading Edge Technologies, Inc.
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WATANABE Hiroyuki
Semiconductor Leading Edge Technologies, Inc.
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Itani Toshiro
Semiconductor Leading Edge Technologies Inc.(selete)
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Watanabe Hiroyuki
Semiconductor Leading Edge Technologies Inc.
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HAGIWARA Takuya
Semiconductor Leading Edge Technologies, Inc. (Selete)
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YAMAZAKI Tamio
Semiconductor Leading Edge Technologies, Inc. (Selete)
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KAWAGUCHI Yasuhide
Asahi Glass Co., Ltd.
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KODAMA Syun-ichi
Asahi Glass Co., Ltd.
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YOKOKOJI Osamu
Asahi Glass Co., Ltd.
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KANEKO Isamu
Asahi Glass Co., Ltd.
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WATANABE Manabu
Semiconductor Leading Edge Technologies, Inc.
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Itani T
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Kaneko Isamu
Asahi Glass Co. Ltd.
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Yamazaki T
Semiconductor Leading Edge Technologies Inc. (selete)
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Yokokoji O
Asahi Glass Co. Ltd.
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Niina Nobumitsu
Scientific Frontier Department Of Applied Chemistry Graduate School Of Engineering Kanagawa Universi
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SEKINE Tomomi
Department of Chemistry, University of Tsukuba
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Kai Toshiyuki
Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation
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MARUYAMA Ken
Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation
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SHIMOKAWA Tsutomu
Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation
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Seki Hiroyuki
Department Of Applied Chemistry Graduate School Of Engineering Kanagawa University
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Hagiwara Takuya
Semiconductor Leading Edge Technologies Inc. (selete)
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Sekine Tomomi
Department Of Chemistry University Of Tsukuba
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Kurose Eiji
Semiconductor Leading Edge Technologies Inc.
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Yamashita Jun
Department Of Chemistry University Of Tsukuba
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Maruyama Ken
Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation
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Itani Toshiro
Semiconductor Leading Edge Technologies Inc. (selete) Research Department 3
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YAMABE Osamu
Semiconductor Leading Edge Technologies, Inc.
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WATANABE Kunjo
Semiconductor Leading Edge Technologies, Inc.
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete) Research Department 3
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Niina Nobumitsu
Science Frontier Department Of Applied Chemistry Graduate School Of Engineering Kanagawa University
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Shimokawa Tsutomu
Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation
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Nakatani Kiyoharu
Department Of Chemistry Graduate School Of Pure And Applied Sciences University Of Tsukuba
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Nakatani Kiyoharu
Department Of Chemistry University Of Tsukuba
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Kawaguchi Y
Asahi Glass Co. Ltd.
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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Watanabe Kunjo
Semiconductor Leading Edge Technologies Inc.
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Watanabe Manabu
Semiconductor Leading Edge Technologies Inc.
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Yamabe Osamu
Semiconductor Leading Edge Technologies Inc.
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc. (Selete), Research Department 3, Tsukuba, Ibaraki 305-8569, Japan
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Matsuda Naohiro
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Harada Tetsuo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
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Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
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Nishikubo Tadatomi
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Yokohama 221-8686, Japan
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Tsunooka Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan
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Nakatani Kiyoharu
Department of Chemistry, University of Tsukuba
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Kudo Hiroto
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Yokohama 221-8686, Japan
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Kawaguchi Etsuro
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba-shi, Ibaraki 305-8569, Japan
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Shinozuka Toyofumi
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan
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Furukawa Takamitsu
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba-shi, Ibaraki 305-8569, Japan
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Kurose Eiji
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba-shi, Ibaraki 305-8569, Japan
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Seki Hiroyuki
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Yokohama 221-8686, Japan
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Toriumi Minoru
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Takahiro Kozawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
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HARADA Tetsuo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
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Watanabe Takeo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
著作論文
- Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures
- The Emergence of Alternative Developers for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- 157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers
- Progress in Top Surface Imaging Process
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Fabrication of 65-nm Holes for 157-nm Lithography
- Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Development of 157 nm Resist Using Highly Exact Theoretical Calculation of Absorption Spectra
- Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups
- A Nonaqueous Potentiometric Titration Study of the Dissociation of t - Butyl Methacrylate - Methacrylic Acid Copolymers
- 157-nm Resist Material Design for Improvement of Its Transparency Using Highly Precise Theoretical Calculation
- Evaluation of High-Transmittance Attenuated Phase Shifting Mask for 157 nm Lithography
- In situ Characterization of Photoresist Dissolution
- Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists
- Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
- Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication
- Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
- Reaction Mechanism of Extreme Ultraviolet Resists
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU
- Extreme Ultraviolet Resist Fabricated Using Water Wheel-Like Cyclic Oligomer with Pendant Adamantyl Ester Groups
- Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
- A Study of Molecular Orientation Effect in Photoresist Films
- Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography
- Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists