Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups

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概要

• 論文の詳細を見る
• 2011-04-15

著者

• Kudo Hiroto

  Kanagawa Univ. Yokohama Jpn

• Kudo Hiroto

  Department Of Applied Chemistry Faculty Of Engineering Kanagawa University

• Oizumi Hiroaki

  Semiconductor Leading Edge Technologies Inc. (selete)

• Nishikubo Tadatomi

  Department Of Applied Chemistry Faculty Of Engineering Kanagawa University

• Niina Nobumitsu

  Scientific Frontier Department Of Applied Chemistry Graduate School Of Engineering Kanagawa Universi

• Itani Toshiro

  Semiconductor Leading Edge Technol. Ibaraki Jpn

• Kai Toshiyuki

  Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation

• MARUYAMA Ken

  Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation

• SHIMOKAWA Tsutomu

  Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation

• Maruyama Ken

  Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation

• Itani Toshiro

  Semiconductor Leading Edge Technologies Inc. (selete) Research Department 3

• Oizumi Hiroaki

  Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn

• Oizumi Hiroaki

  Semiconductor Leading Edge Technologies Inc. (selete) Research Department 3

• Niina Nobumitsu

  Science Frontier Department Of Applied Chemistry Graduate School Of Engineering Kanagawa University

• Shimokawa Tsutomu

  Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation

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