Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)
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概要
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The synthesis and properties of noria derivatives containing oxetanyl groups were investigated for their application as negative-type extreme ultraviolet (EUV) resist materials. The solubility, film-forming ability, and photochemical reactivity were consistent with the structures of noria derivatives. The patterning properties of the synthesized noria derivatives were also examined using an EUV system, and patterns with 45 and 50 nm half-pitch resolution were obtained.
- 2010-06-25
著者
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Kudo Hiroto
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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Seki Hiroyuki
Department Of Applied Chemistry Graduate School Of Engineering Kanagawa University
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Kato Yuki
Department Of Applied Mathematics And Physics Tottori University
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Hiroaki Oizumi
Research Dept. 3, Semiconductor Leading Edge technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Toshiro Itani
Research Dept. 3, Semiconductor Leading Edge technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tadatomi Nishikubo
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Rokkakubashi, Kanagawa-ku, Yokohama 221-8686, Japan
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Hiroto Kudo
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Rokkakubashi, Kanagawa-ku, Yokohama 221-8686, Japan
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Hiroyuki Seki
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Rokkakubashi, Kanagawa-ku, Yokohama 221-8686, Japan
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