Novel Molecular Photo-resists Based on the Cyclodextrin Derivatives Containing Fluorine Atoms and t-Butyl Ester Groups
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概要
- 論文の詳細を見る
- 2005-04-15
著者
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Kudo Hiroto
Kanagawa Univ. Yokohama Jpn
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Kudo Hiroto
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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Nishikubo Tadatomi
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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INOUE Naomi
Department of Applied Chemistry, Faculty of Engineering, Kanagawa University
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NISHIMURA Isao
Semiconductor Materials Laboratory, Fine Electronic Research Laboratories, JSR Corporation
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Nishimura Isao
Semiconductor Materials Laboratory Fine Electronic Research Laboratories Jsr Corporation
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Inoue Naomi
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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