Oizumi Hiroaki | Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
スポンサーリンク
概要
関連著者
-
Oizumi Hiroaki
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
-
Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
-
KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
-
Tagawa Seiichi
The Institute Of Scientific And Industrial Research
-
Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
-
Toshiro Itani
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
-
Kudo Hiroto
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
-
Iwamoto T
Research And Analytical Center For Giant Molecules Graduate School Of Science Tohoku University
-
Nishikubo Tadatomi
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
-
Itani Toshiro
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
-
古沢 孝弘
Osaka University
-
Itani Toshiro
Euvl Infrastructure Dev. Center Inc. Ibaraki Jpn
-
Seiichi Tagawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
-
TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
-
関 修平
大阪大学産業科学研究所
-
KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
-
Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
-
ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
-
Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
-
Harada Tetsuo
Laboratory Of Environmental Physiology Faculty Of Education Kochi University
-
Kudo Hiroto
Kanagawa Univ. Yokohama Jpn
-
Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
-
Itani T
Semiconductor Leading Edge Technologies Inc. (selete)
-
Tagawa S
Osaka Univ. Osaka Jpn
-
Niina Nobumitsu
Scientific Frontier Department Of Applied Chemistry Graduate School Of Engineering Kanagawa Universi
-
Kai Toshiyuki
Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation
-
MARUYAMA Ken
Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation
-
SHIMOKAWA Tsutomu
Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation
-
Seki Hiroyuki
Department Of Applied Chemistry Graduate School Of Engineering Kanagawa University
-
Maruyama Ken
Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation
-
Itani Toshiro
Semiconductor Leading Edge Technologies Inc. (selete) Research Department 3
-
Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete) Research Department 3
-
Niina Nobumitsu
Science Frontier Department Of Applied Chemistry Graduate School Of Engineering Kanagawa University
-
Shimokawa Tsutomu
Semiconductor Materials Laboratory Fine Electronic Materials Research Laboratories Jsr Corporation
-
Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
-
Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
-
Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
-
Oizumi Hiroaki
Semiconductor Leading Edge Technologies, Inc. (Selete), Research Department 3, Tsukuba, Ibaraki 305-8569, Japan
-
Matsuda Naohiro
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
-
Itani Toshiro
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
-
Harada Tetsuo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
-
Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
-
Nishikubo Tadatomi
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Yokohama 221-8686, Japan
-
Kudo Hiroto
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Yokohama 221-8686, Japan
-
Tanaka Katsutomo
Mitsubishi Chemical Corporation, 1-1 Shiroishi, Kurosaki, Yahatanisi-ku, Kitakyusyu 806-0004, Japan
-
Kawakami Kiminori
Mitsubishi Chemical Group Science and Technology Research Center, 1000, Kamoshida-cho, Aoba-ku, Yokohama 227-8502, Japan
-
Seki Hiroyuki
Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, Yokohama 221-8686, Japan
-
Takahiro Kozawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
-
Itani Toshiro
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
-
Itani Toshiro
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
-
HARADA Tetsuo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
-
Kiminori Kawakami
Mitsubishi Chemical Group Science and Technology Research Center, 1000, Kamoshida-cho, Aoba-ku, Yokohama 227-8502, Japan
-
Watanabe Takeo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
著作論文
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Development of New Positive-Tone Molecular Resists Based on Fullerene Derivatives for Extreme Ultraviolet Lithography
- Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups
- Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU
- Extreme Ultraviolet Resist Fabricated Using Water Wheel-Like Cyclic Oligomer with Pendant Adamantyl Ester Groups
- Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography
- Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists