Toshiro Itani | Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan

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概要

• Itani Toshiroの詳細を見る
• 同名の論文著者
• Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japanの論文著者

関連著者

• Toshiro Itani

  Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan

• Oizumi Hiroaki

  Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn

• Itani Toshiro

  Semiconductor Leading Edge Technol. Ibaraki Jpn

• Seiichi Tagawa

  The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

• KOZAWA Takahiro

  The Institute of Scientific and Industrial Research (ISIR), Osaka University

• Santillan Julius

  Semiconductor Leading Edge Technologies Inc.

• Morita Masamichi

  Daikin Industries Ltd

• Toshiro Itani

  Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan

• Julius Joseph

  Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan

• Tanaka Katsutomo

  Mitsubishi Chemical Corporation, 1-1 Shiroishi, Kurosaki, Yahatanisi-ku, Kitakyusyu 806-0004, Japan

• Kawakami Kiminori

  Mitsubishi Chemical Group Science and Technology Research Center, 1000, Kamoshida-cho, Aoba-ku, Yokohama 227-8502, Japan

• Masamichi Morita

  Daikin Industries, Ltd., 1-1 Nishi Hitotsuya, Settsu, Osaka 566-8585, Japan

• Yamashita Tsuneo

  Daikin Industries, Ltd., 1-1 Nishi Hitotsuya, Settsu, Osaka 566-8585, Japan

• Yoshito Tanaka

  Daikin Industries, Ltd., 1-1 Nishi Hitotsuya, Settsu, Osaka 566-8585, Japan

• Tsuneo Yamashita

  Daikin Industries, Ltd., 1-1 Nishi Hitotsuya, Settsu, Osaka 566-8585, Japan

• Takahiro Kozawa

  The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

• Kiminori Kawakami

  Mitsubishi Chemical Group Science and Technology Research Center, 1000, Kamoshida-cho, Aoba-ku, Yokohama 227-8502, Japan

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著作論文

• Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography
• Development of New Positive-Tone Molecular Resists Based on Fullerene Derivatives for Extreme Ultraviolet Lithography
• Fluorinated-Polymer Based High Sensitivity Extreme Ultraviolet Resists
• Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists

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