Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
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概要
- 論文の詳細を見る
Vacuum ultraviolet (VUV)-light-induced photodegradation of conventional KrF and ArF resists and fluorine-containing polymers for F2 resist was qualitatively studied by reflection absorption infrared spectroscopy. Outgassing from these resists was quantitatively studied by an in situ quartz crystal microbalance (QCM) technique. t-Butoxycarbonyl (BOC), methoxymethyl (MOM), ethoxyethyl (EOE) and t-butyl (BUO) units as a blocking moiety of phenolic OH decomposed on irradiation at 146 nm. The amounts of outgassing from these blocking units decreased in the order EOE $>$ BOC $>$ BUO $>$ MOM. This order was consistent with the order of photodegradability of the resists checked by FT-IR spectroscopy. BOC units attached to hexafluoroisopropanol units photodecomposed faster than BOC units attached to phenolic OH. The amounts of outgassing from t-butyl ester unit and its analogue in conventional ArF resists and fluorine-containing F2 resist were almost the same as that from BOC units in KrF resist.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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SHINOZUKA Toyofumi
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Itani Toshiro
Semiconductor Leading Edge Technol. Ibaraki Jpn
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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Itani Toshiro
Semiconductor Leading Edge Technologies, Inc, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tsunooka Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan
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Shinozuka Toyofumi
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan
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