Cyclic O-Acyloximes as Novel Photolatent Bases
スポンサーリンク
概要
- 論文の詳細を見る
- 2010-04-05
著者
-
白井 正充
大阪府立大学大学院工学研究科
-
SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
-
Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
-
SUYAMA Kanji
Department of Applied Chemistry, Osaka Prefecture University
-
Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
-
INOUE Tomohiro
Department of Natural Sciences, Faculty of Science and Engineering, Tokyo Denki University
-
Inoue Tomohiro
Department Of Applied Chemistry Osaka Prefecture University
-
Shirai Masamitsu
Osaka Prefecture Univ. Osaka Jpn
-
Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
-
Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
関連論文
- フォトポリマーの研究 : 継続は力なり
- 大阪府立大学中百舌鳥キャンパス
- Low-E_a Chemical Amplification Resists for 193nm Lithography
- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
- エポキシ含有フルオレン : ポリシランブレンド系の光架橋
- スルホン酸エステル含有エポキシ架橋剤を用いた再可溶化型架橋系
- 新規スルホン酸エステル基を含有するエポキシポリマーの光架橋と水への再溶解
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- リワーク能を有する光架橋・硬化樹脂
- 熱分解型多官能架橋剤を用いたリワーク型光架橋系
- リワーク機能を有する光架橋・硬化樹脂
- 溶かす フォトレジスト--性能を決める溶解特性
- Photocrosslinking of Oligomers Bearing Glycidyl Sulfonate Ester Units and Their Redissolution Property
- 水による溶解除去が可能なオキセタン部位含有光架橋性高分子 (特集:光とネットワークポリマー)
- 光重合
- Photocrosslinking and Thermal Degradation of Epoxy-containing Polymers Using Photobase Generators
- 超微細加工用フォトレジスト材料
- Effect of Anions on Photoreacitivity and Stability of Quaternary Ammonium Salts as Photobase Generators
- 光酸・塩基発生剤の開発とその新規フォトポリマー設計における活用
- 再溶解型光架橋・硬化樹脂
- Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
- Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
- Visible Light-induced Cationic Polymerization of Epoxides Sensitized by Benzoquinonylsulfanyl Derivatives
- Photo-Induced Radical Polymerization Sensitized by Benzoquinonylsulfanyl Derivatives
- Photo- and Thermochemical Behavior of Quaternary Ammonium Thiocyanates and Their Use as Crosslinkers
- Triplet State of O-Acyloximes Studied by Time-Resolved Absorption Spectroscopy
- Water Sorption and Drying Behavior of Crosslinked Dextrans
- 熱分解型ジエポキシ化合物を用いた再可溶化型架橋性高分子
- Incidence of Ischemic Lesions by Diffusion-Weighted Imaging After Carotid Endarterectomy With Routine Shunt Usage
- Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
- Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrenes Derivatives by 146 nm Light
- Surface Modification Resists Using Photoacid and Photobase Generating Polymers
- Photolysis of Quaternary Ammonium Dithiocarbamates and Their Use as Photobase Generators
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Cyclic O-Acyloximes as Novel Photolatent Bases
- Enhanced photochemical generation of amines from trifunctional O-acyloxime
- Photocrosslinking System Using Highly-Functionalized Epoxy Crosslinkers Having Degradable Property
- 光酸・塩基発生剤の開発とその新規フォトポリマー設計における活用 (特集 光化学)
- 熱硬化性樹脂の再利用しやすい分解手法 (特集 新しい機能付与をめざす樹脂改質と新グレードの開発)
- 亜臨界水を用いた架橋樹脂の分解とケミカルリサイクル (特集 ポリマーの分解とその応用技術)
- Polymeric Photobase Generator with a New Architecture: Comparison of Random and Block Copolymers Prepared by RAFT Polymerization Technique
- FRPの分解とリサイクル (特集:廃棄物の再資源化技術)
- Crosslinking of Oligomers Utilizing Sensitized Photoreaction at 366 nm and Thermal Decomposition of Pendant Carbamoyloxyimino Groups
- Photo-Crosslinking of Poly(glycidyl methacrylate) Using Di-functional Photobase Generators
- Development of Novel Photosensitive Polymer Systems Using Photoacid and Photobase Generators
- Visible Light Crosslinking of Polymeric Photobase Generators Using Ketobiscoumarins
- Terson's Syndrome as the Initial Symptom of Subarachnoid Hemorrhage Caused by Ruptured Vertebral Artery Aneurysm : Case Report
- "Infra-Posterior Inferior Cerebellar Artery Aneurysm" Arising After Occlusion of the Ipsilateral Vertebral Artery
- Delayed Central Respiratory Dysfunction After Wallenberg's Syndrome : Case Report
- Poly(α-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography (2) F2 Excimer Laser Exposure Characteristics
- Negative EUV resist based on thiol-ene system
- Non-chemically amplified EUV resist based on PHS
- 解説記事 再可溶化できる光架橋型高分子
- グリーンケミストリーと高分子の崩壊と安定化 (特集 グリーンテクノロジーの新展開)
- 高分子材料の光分解性と高分子添加剤 (新春特集 高分子添加剤の開発とグリーンケミストリー)
- 再溶解能を有する光架橋性ポリマー
- メタクリル酸メチル-アクリル酸エステル共重合体の185nm光によるアブレーティブ分解
- Preparation of replicated resin mold for UV nanoimprint using reworkable dimethacrylate
- Analysis of chain propagation in UV curing using reworkable resin
- i-Line sensitive photoacid generators using thianthrenium derivatives
- I-line sensitive non-ionic photoacid generators having thianthrene skeleton
- Degradable Network Polymers Based on Di(meth)acrylates
- Highly Sensitive Photocrosslinking System Using Fluorene Derivatives Having Vinyl Ether or Epoxy Moiety
- Multi-Functional Methacrylates Bearing Thermal Degradation Properties--Synthesis, Photo- and Thermal Curing, and Thermolysis
- Photocrosslinkable Polymers with Redissolution Property
- 2-333 地域の中小企業技術者に対する工学教育プログラム((18)産学連携教育-II,口頭発表論文)
- 光によるアミンの生成を利用する表面修飾型フォトレジスト
- Base Generation by the Photolysis of an Amineimide with Triplet-sensitizers and Its Use for an Epoxide/Thiol Curing System
- UV/EB硬化技術--高分子材料への活用 (小特集 UV/EB硬化技術の最新の展開)
- Low-$E_{\text{a}}$ Chemical Amplification Resists for 193 nm Lithography
- Photoacid and Photobase Generators : Prospects and Their Use in the Development of Polymeric Photosensitive System
- リワーク型低収縮ジメタクリラートとそのUVインプリント材料への応用 : 樹脂構造の影響 (特集 光とネットワークポリマー)
- Electronic Structure of SrTi.Sc.O Thin Film Studied by High-Resolution Soft-X-ray Spectroscopy
- Synthesis and Properties of Novel i- and g-Line Sensitive Photoacid Generators Based on 9-Fluorenone Derivatives with Aryl-Ethynyl Units
- Relationship between Symptoms of Temporomandibular Disorders and Upper Quadrant Posture : a Preliminary Study
- Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
- Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- 熱分解型多官能架橋剤を用いたりワーク型光架橋系
- 水による溶解除去が可能なオキセタン部位含有光架橋性高分子
- A Reworkable Photothermal Dual-curing System