Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-01-15
著者
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Nakano K
Jisso And Production Technologies Research Laboratories Nec Corporation
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MAEDA Katsumi
Jisso and Production Technologies Research Laboratories, NEC Corporation
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NAKANO Kaichiro
Jisso and Production Technologies Research Laboratories, NEC Corporation
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IWASA Shigeyuki
Fundamental and Environmental Research Laboratories, NEC Corporation
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HASEGAWA Etsuo
Fundamental and Environmental Research Laboratories, NEC Corporation
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Maeda Kenichi
Jisso And Production Technologies Research Laboratories Nec Corporation
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