Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)

概要

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A series of transparent photochemical acid-generators(PAGs)has been successfully prepared and investigated to apply ArF excimer-laser lithography. These PAGs were synthesized as new alkylsulfonium salts that have cycloalkyl groups but no aromatic ones. They were almost transparent at 193.4nm and have high acid-generation efficiency enough to use for ArF excimer-laser resists. The photochemical reaction of these alkylsulfonium salts occurs mainly due to the S-C bond fission. A resist utilizing the PAGs was capable to resolve a 0.2μm L/S pattern at a 50-mJ/cm^2 dose with an aqueous alkaline developer. These PAGs are promising materials for use in ArF excimer-laser lithography.
社団法人電子情報通信学会の論文
1998-07-25