Nakano K | Jisso And Production Technologies Research Laboratories Nec Corporation
スポンサーリンク
概要
関連著者
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Nakano K
Jisso And Production Technologies Research Laboratories Nec Corporation
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Maeda Kenichi
Jisso And Production Technologies Research Laboratories Nec Corporation
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IWASA Shigeyuki
Fundamental and Environmental Research Laboratories, NEC Corporation
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Nakano Kaichiro
Jisso And Production Technologies Research Laboratories Nec Corporation
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Iwasa Shigeyuki
Fundamental And Environmental Research Laboratories Nec Corporation
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Maeda Ken-ichi
Jisso And Production Technologies Research Laboratories Nec Corporation
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HASEGAWA Etsuo
Functional Materials Research Laboratories, NEC Corporation
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Hasegawa E
Fundamental And Environmental Research Laboratories Nec Corporation
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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MAEDA Katsumi
Functional Devices Research Laboratories, NEC Corporation
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MAEDA Katsumi
Jisso and Production Technologies Research Laboratories, NEC Corporation
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NAKANO Kaichiro
Jisso and Production Technologies Research Laboratories, NEC Corporation
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HASEGAWA Etsuo
Fundamental and Environmental Research Laboratories, NEC Corporation
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NAKANO Kaichiro
Functional Materials Research Laboratories, NEC Corporation
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IWASA Shigeyuki
Functional Materials Research Laboratories, NEC Corporation
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NAKANO Kaichiro
the Functional Devices Research Laboratories, NEC Corporation
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MAEDA Katsumi
the Functional Devices Research Laboratories, NEC Corporation
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IWASA Shigeyuki
the Functional Devices Research Laboratories, NEC Corporation
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HASEGAWA Etsuo
the Functional Devices Research Laboratories, NEC Corporation
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Nakano Ken-ichi
NTT Communication Switching Laboratories
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Yasuda Kei-ichi
NTT Communication Switching Laboratories
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Kishimoto Tohru
NTT Communication Switching Laboratories
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Maeda Katsumi
Functional Devices Research Laboratories Nec Corporation
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Hasegawa Etsuo
Functional Materials Res.labs. Nec Corp.
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Nakano Kaichiro
Functional Materials Research Laboratories Nec Corporation
著作論文
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists
- ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
- Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists
- Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)
- ArF Chemically Amplified Negative Resists Using Alicyclic Epoxy Polymer
- Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193nm Lithography
- Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists
- High-Density, High-Bandwidth Connectors for Broad-Band ISDN (Special Issue on Recent Electromechanical Devices)