SHIRAI Masamitsu | Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
スポンサーリンク
概要
- 同名の論文著者
- Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture Universityの論文著者
関連著者
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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白井 正充
大阪府立大学大学院工学研究科
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TSUNOOKA Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Tsunooka M
Osaka Prefecture Univ. Osaka Jpn
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Matsuo Takahiro
Matsushita Electric Industrial Co. Ltd. (panasonic)
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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SUYAMA Kanji
Department of Applied Chemistry, Osaka Prefecture University
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Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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MAEDA Katsumi
Jisso and Production Technologies Research Laboratories, NEC Corporation
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NAKANO Kaichiro
Jisso and Production Technologies Research Laboratories, NEC Corporation
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LALEVEE Jacques
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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ALLONAS Xavier
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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FOUASSIER Jean-Pierre
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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Shirai Masamitsu
Osaka Prefecture Univ. Osaka Jpn
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Okamura Haruyuki
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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SHIN Kazuo
Department of Nuclear Engineering, Kyoto University
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Kasai Kohei
Tokyo Ohka Kogyo Co. Ltd.
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Ogata Toshiyuki
Tokyo Ohka Kogyo Co. Ltd.
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FURUYA Sanae
Tokyo Ohka Kogyo Co., Ltd.
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HADA Hideo
Tokyo Ohka Kogyo Co., Ltd.
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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Kishimura Shinji
Ulsi Laboratory Mitsubishi Electric Corporation:semiconductor Group System Lsi Division
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Nakano K
Jisso And Production Technologies Research Laboratories Nec Corporation
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IWASA Shigeyuki
Fundamental and Environmental Research Laboratories, NEC Corporation
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HASEGAWA Etsuo
Fundamental and Environmental Research Laboratories, NEC Corporation
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Maeda Kenichi
Jisso And Production Technologies Research Laboratories Nec Corporation
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Shin Kazuo
Department Of Applied Chemistry Osaka Prefecture University
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Maeda Katsumi
Jisso And Production Technologies Research Laboratories Nec Corporation
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Sasago Masaru
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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OHBA Tadahiro
Department of Applied Chemistry, Osaka Prefecture University
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NAKAI Daisuke
Department of Applied Chemistry, Osaka Prefecture University
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SHINOZUKA Toyofumi
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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QU Weihong
Department of Applied Chemistry, Osaka Prefecture University
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Qu Weihong
Department Of Applied Chemistry Osaka Prefecture University
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TACHI Hideki
Department of Applied Chemistry, Osaka Prefecture University
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INOUE Tomohiro
Department of Natural Sciences, Faculty of Science and Engineering, Tokyo Denki University
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Katsuyama Akiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Katsuyama Akiko
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Itani Toshiro
Semiconductor Leading Edge Technologies Inc
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Tachi Hideki
Department Of Applied Chemistry Osaka Prefecture University
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Inoue Tomohiro
Department Of Applied Chemistry Osaka Prefecture University
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OKAMURA Haruyuki
Department of Applied Chemistry, Osaka Prefecture University
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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Okamura Haruyuki
Osaka Prefecture Univ. Osaka Jpn
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Okamura Haruyuki
Department Of Applied Chemistry Osaka Prefecture University
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Kodama Shintaro
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Ohba Tadahiro
Osaka Prefecture Univ. Osaka Jpn
著作論文
- Low-E_a Chemical Amplification Resists for 193nm Lithography
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- Photocrosslinking and Thermal Degradation of Epoxy-containing Polymers Using Photobase Generators
- Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
- Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
- Visible Light-induced Cationic Polymerization of Epoxides Sensitized by Benzoquinonylsulfanyl Derivatives
- Triplet State of O-Acyloximes Studied by Time-Resolved Absorption Spectroscopy
- Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Cyclic O-Acyloximes as Novel Photolatent Bases
- Photocrosslinking System Using Highly-Functionalized Epoxy Crosslinkers Having Degradable Property
- Synthesis and Properties of Novel i- and g-Line Sensitive Photoacid Generators Based on 9-Fluorenone Derivatives with Aryl-Ethynyl Units