Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
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概要
- 論文の詳細を見る
- 2003-02-05
著者
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白井 正充
大阪府立大学大学院工学研究科
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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Matsuo Takahiro
Matsushita Electric Industrial Co. Ltd. (panasonic)
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TSUNOOKA Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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LALEVEE Jacques
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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ALLONAS Xavier
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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FOUASSIER Jean-Pierre
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Tsunooka M
Osaka Prefecture Univ. Osaka Jpn
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Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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