Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-09-15
著者
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Kametani Hitoshi
General Research Laboratory Mitubishi Electric Corporation
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Kondo H
The Institute Of Scientific And Industrial Research Osaka University
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ENDO Masamori
Department of Physics, School of Science, Tokai University
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Endo M
Department Of Physics School Of Science Tokai University
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Kondo Hideyuki
Central Research Institute Mitsubishi Materials Corporation
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MURAKAMI Katsuhiko
Nikon Corporation
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IRIE Shigeo
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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ENDO Masayuki
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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SASAGO Masaru
Matsushita Electric Industrial Co., Ltd. (Panasonic)
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Kondo H
Nikon Corp.
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Irie S
Semiconductor Leading Edge Technologies Ibaraki Jpn
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Irie Shigeo
Semiconductor Leading Edge Technologies Inc. (selete)
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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Sasago Masaru
Matsushita Electric Industrial Co.
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KANDAKA Noriaki
Nikon Co.
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KONDO Hiroyuki
Nikon Co.
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Kandaka N
Nikon Corp.
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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MURAKAMI Katsuhiko
Nikon Corp.
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