Characterization of Separation-by-Implanted-Oxygen Wafers with Monoenergetic Positron Beams
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-09-15
著者
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Kametani Hitoshi
General Research Laboratory Mitubishi Electric Corporation
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SUZUKI Ryoichi
Electrotechnical Laboratory
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MIKADO Tomohisa
Electrotechnical Laboratory
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OHGAKI Hideaki
Electrotechnical Laboratory
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TANIGAWA Shoichiro
Institute of Materials Science, The University of Tsukuba
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UEDONO Akira
Institute of Materials Science, University of Tsukuba
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Uedono Akira
Institute Of Applied Physics University Of Tsukuba
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WEI Long
Institute of Materials Science, University of Tsukuba
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Kawai M
Kawasaki Heavy Industries Ltd.
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Ohgaki H
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Suzuki R
National Institute Of Advanced Industrial Science And Technology
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AKIYAMA Hajime
LSI Research and Development Laboratory, Mitubishi Electric Corporation
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YAMAGUCHI Yasuo
General Research Laboratory, Mitubishi Electric Corporation
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KOUMARU Masaki
LSI Research and Development Laboratory, Mitubishi Electric Corporation
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Wei Long
Institute Of Materials Science University Of Tsukuba
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MIKADO Tomohisa
National Institute of Advanced Industrial Science and Technology (AIST)
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Mikado Tomohisa
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tanigawa Shoichiro
Institute Of Applied Physics University Of Tsukuba
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Akiyama H
Institute For Solid State Physics University Of Tokyo
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Yamaguchi Y
Fuji Xerox Co. Ltd. Kanagawa Jpn
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Kondo H
Nikon Corp.
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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