Characterization of Hydrogenated Amorphous Silicon Films by a Pulsed Positron Beam
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-10-15
著者
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Yamazaki Tetsuo
Elecltrotechnical Laboratory:(present Address) Institute Of Advanced Energy Kyoto University
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SUZUKI Ryoichi
Electrotechnical Laboratory
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KOBAYASHI Yoshinori
National Chemical Laboratory for Industry
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MIKADO Tomohisa
Electrotechnical Laboratory
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OHGAKI Hideaki
Electrotechnical Laboratory
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CHIWAKI Mitsukuni
Electrotechnical Laboratory
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YAMAZAKI Tetsuo
Electrotechnical Laboratory
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MATSUDA Akihisa
Electrotechnical Laboratory
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CHIWAKI Mitsukuni
Elecltrotechnical Laboratory
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Ohgaki H
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Ohgaki Hideaki
National Institute Of Advanced Industrial Science And Technology
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Kobayashi Y
Tokai Univ. Kanagawa Jpn
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Suzuki R
National Institute Of Advanced Industrial Science And Technology
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TOMIMASU Takio
Electrotechnical Laboratory
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Kobayashi Y
Ntt Basic Research Lab. Kanagawa
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Kobayashi Y
Matsushita Electric Industrial Co. Ltd. Kyoto Jpn
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Suzuki Ryoichi
National Institute Of Advanced Industrial Science And Technology
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MIKADO Tomohisa
National Institute of Advanced Industrial Science and Technology (AIST)
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MASHIMA Satoshi
Electrotechnical Laboratory
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MCELHENY Peter
Electrotechnical Laboratory
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Kangawa Yoshihiro
Department Of Applied Chemistry Tokyo University Of Agriculture And Technology
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Mikado Tomohisa
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Moriya Tsuyoshi
Institute Of Material Science University Of Tsukuba
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TOYAMA Masaharu
Toshiba Research and Development Center
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Mcelheny P
Electrotechnical Laboratory
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Tomimasu Takio
Electrotechnical Laboratory:(present Address)fel Engineering Corp.
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Tomimasu Takio
Electrotechnical Laboraory
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Mikado T
Electrotechnical Laboratory
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Mikado Tomohisa
Institute Of Materials Science University Of Tsukuba
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