Spatial Distribution of SiH_3 Radicals in RF Silane Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-03-20

著者

• YAMADA Chikashi

  Institute for Laser Science, The University of Electro-Communications

• MATSUDA Akihisa

  Electrotechnical Laboratory

• GOTO Toshio

  Department of Quantum Engineering, Nagoya University

• HIROTA EIZI

  Institute for Molecular Science

• ITABASHI Naoshi

  Central Research Laboratory, Hitachi, Ltd.

• Naito Susumu

  Department Of Electronics Faculty Of Engineering Nagoya University

• Itabashi N

  Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)

• Matsuda A

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University

• MAGANE Mitsuo

  Department of Electronics, Faculty of Engineering, Nagoya University

• ITABASHI Naoshi

  Department of Electronics, Faculty of Engineering, Nagoya University

• NISHIWAKI Nobuki

  Department of Electronics, Faculty of Engineering, Nagoya University

• Magane Mitsuo

  Department Of Electronics Faculty Of Engineering Nagoya University

• Nishiwaki Nobuki

  Department Of Electronics Faculty Of Engineering Nagoya University

• Goto Toshio

  Department Of Electronics Faculty Of Engineering Nagoya University

• Hirota E

  Guraduate Univ. Advanced Studies Yokohama

• Yamada Chikashi

  Institute For Molecular Science

• Goto Toshio

  Department Of Electronic Mechanical Engineering Nagoya University

• GOTO Toshio

  Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University

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