CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition (<Special Issue> Plasma Processing)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• Takahashi K

  National Inst. Res. In Inorganic Materials Ibaraki Jpn

• Hori Masaru

  Department Of Quantum Engineering Nagoya University

• GOTO Toshio

  Department of Quantum Engineering, Nagoya University

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• Takahashi K

  Department Of Physical Electronics Tokyo Institute Of Tecnology

• KISHIMOTO Shigeru

  Department of Quantum Engineering, Nagoya University

• Takahashi K

  Tokyo Inst. Technol. Yokohama Jpn

• Kishimoto Shigeru

  Department Of Quantum Engineering School Of Engineering Nagoya University

• Kishimoto Shigeru

  Department Of Electrical Engineering Faculty Of Engineering Nagoya University

• Takahashi Kuniharu

  Graduate School Of Science And Technology Niigata University

• Takahashi Kouchiro

  National Institute For Research In Inorganic Materials

• TAKAHASHI Kunimasa

  Department of Quantum Engineering, School of Engineering, Nagoya Univeristy

• Goto Toshio

  Department Of Electronics Faculty Of Engineering Nagoya University

• Goto Toshio

  Department Of Electronic Mechanical Engineering Nagoya University

• TAKAHASHI Kenji

  Semiconductor Research Laboratory, Pioneer Electronic Corporation

• GOTO Toshio

  Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University

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