Roles of SiH_3 and SiH_2 Radicals in Particle Growth in rf Silane Plasmas

スポンサーリンク

概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Hori Masaru

  Department Of Quantum Engineering Nagoya University

• WATANABE Yukio

  Department of Human Genetics, Nagasaki University Graduate School of Biomedical Sciences

• Yamamoto Yasuo

  Department Of Chemistry College Of Science Rikkyo University

• GOTO Toshio

  Department of Quantum Engineering, Nagoya University

• OHKURA Hiroshi

  Department of Applied Physics,Osaka City University

• Yamamoto Yuichi

  Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul

• Samukawa Seiji

  Vlsi Development Div. Nec Corporation

• SHIRATANI Masaharu

  Department of Electrical Engineering, Faculty of Engineering, Kyushu University

• KAWASAKI Hiroharu

  Department of Electronic Device Engineering, Graduate School of Information Science and Electrical E

• FUKUZAWA Tsuyoshi

  Department of Electronic Device Engineering, Graduate School of Information Science and Electrical E

• SUGANUMA Shinji

  Department of Electronics, Faculty of Engineering, Nagoya University

関連論文

• Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
• Monomeric 10-Sb-5 Pentacoordinate Organoantimony Monohalides and Their Permutational Behavior
• Synthesis, Structure, and Reactions of 10-Sn-5 Organotin Ate Complexes
• The IHPK1 gene is disrupted at the 3p21. 31 breakpoint of t(3 ; 9) in a family with type 2 diabetes mellitus
• A catalog of 106 single-nucleotide polymorphisms (SNPs) and 11 other types of variations in genes for transforming growth factor-β1 (TGF-β1) and its signaling pathway
• LRP5, low-density-lipoprotein-receptor-related protein 5, is a determinant for bone mineral density
• Fabrication of Carbon Nanowalls Using Novel Plasma Processing
• Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
• Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
• High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
• Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
• High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
• Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
• Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH_4 Plasma with Ar, N_2, and H_2 Dilution Gases
• A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
• Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
• Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF_4 Plasmas
• Development of Compact C_2F_4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
• Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C_5F_O/N_2 Plasma
• Synthesis, Structure, and Reactions of a 10-Sb-4 Type Antimony Ate Complex
• Reincrease in Electron Density in the Current-Decaying Phase of Pulsed-Discharge of Argon-Hydrogen Mixture : Nuclear Science, Plasmas and Electric Discharges
• Generation of a Large Swelling in the Spatial Magnetic Field Profile near the Coil Axis of a Theta Pinch
• On Shifting of Plowed Plasma to Back of Current Sheath in Implosion Phase of Theta-Pinch
• Generation of Magnetic Islands Caused by Periodical Nonuniformity of Axial Magnetic Field for FRC Formation Phase
• Study on Electron Density Dependence of Metastable Ar^+ Density in Pulsed-Discharge Plasma by Using LIF Method
• On Applicability of Laser-Induced Fluorescence from the Metastable State of Argon Ions to Ion Density Measurements
• Dependence of Evolution of Field Reconnection at Coil End Region on Mirror Field in FRC Formation Stage
• Observation of the Anomalous Swelling of a Local Magnetic Field in a Linear Theta Pinch
• Ion Saturation Current in a Orbital Motion Limited Region
• Octave Spanning High Quality Super Continuum Generation Using 10nJ and 104fs High Energy Ultrashort Soliton Pulse
• Combinatorial Plasma Etching Process
• Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process
• Control of Electric Conduction of Carbon Nanowalls
• Electrical Characterization of Carbon Nanowalls
• Large Annular Purpura and Paraneoplastic Purpura in a Patient with Sjogren's Syndrome and Cervical Cancer
• Erythema Elevatum Diutinum Complicated by Rheumatoid Arthritis
• High Performance of Silicon Oxide Selective Etching Using F_2 Gas and Graphite Instead of Perfluorinated Compound Gases
• Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma
• Behaviors of carbon atom density in hydrocarbon and fluorocarbon plasmas
• Measurement of Einstein's A Coefficient of the 296.7 nm Transition Line of the Carbon Atom
• Measurement of Carbon Atom Density in High Density Plasma Process
• Stabilized Self-Sustained Sequence Replication against Evolutionary Instability
• Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
• Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
• Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
• Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
• IS-56 Heparin-binding Epidermal Growth Factor-like growth Factor Is an Autocrine Growth Factor Essential for the Survival of Human Luteinized Granulosa Cells
• CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
• "Miocene calcareous nannofossils of the Bihoku group in the Shobara area, Hiroshima prefecture, southwest Japan"
• Evaluation of CF_2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO_2 Etching Process Using Radical Injection Technique
• CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
• Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma
• CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
• Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
• Heating and Particle Diffusion due to Lower-Hybrid Resonant Parametrie Instability
• Observation of Transition from Resonant to Nonresonant Lower-Hybrid Parametric Decay Process
• Effects of the Collisional Damping on a Nonresonant Parametric Instability near the Lower-Hybrid Frequency
• Effect of Ion Acoustic Waves on Diffusion in a Magnetized Plasma
• A Method for Measurement of Ion Temperature in a Low Pressure Magnetized Plasma
• Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F_2/Ar Gases
• Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
• Measurement of Spatial Distribution of SiF_4 and SiF_2 Densities in High Density SiF_4 Plasma Using Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
• Spatial Distribution Measurement of Absolute Densities of CF and CF_2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
• Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar^+ Beam with Hydrogen and Fluorocarbon Radical Injection
• In Situ Observation of Particle Behavior in rf Silane Plasmas
• Seed-Atom Density Profiles in a Boundary Layer on a Flat Plate in MHD Combustion Gas Plasmas : Nuclear Science, Plasmas and Electric Discharges
• Development of Photon-Counting Laser-Light-Scattering Method for Detection of Nano-Particles Formed in CVD Plasmas (レ-ザ-および放射光の半導体プロセス分野への応用特集号)
• Growth Kinetics and Behavior of Dust Particles in Silane Plasmas
• Development and Characterization of a New Compact Microwave Radical Beam Source
• Preparation and Clinical Evaluation of Streptokinase Jelly for Intractable Decubitus and Skin Ulcer
• Near-Resonant Rayleigh Scattering Method for Measurements of Alkali Atomic Density in Combustion Gas Plasmas
• SONRES for Measurement of Relative Spatial Seed Distribution in Channel of MHD Power Generator
• Roles of SiH_3 and SiH_2 Radicals in Particle Growth in rf Silane Plasmas
• Effects of Dilution Gases on Si Atoms and SiHx^^+ (X = 0-3) Ions in Electron Cyclotron Resonance SiH_4 Plasmas
• Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
• HI-Mediated Cyclization of o-Alkynylstyrenes
• Synthesis and Structure of a Germylene Bearing a 1, 8-Dimethoxyanthracene Ligand
• Synthesis of a New Tridentate Anthracene Ligand Bearing (i-Pr9_2P Group at 1,8-Positions: Facile Bond Switch on Tetracoordinate Boron Atom
• Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source
• Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source
• Investigation of Particulate Growth Processes in RF Silane Plasmas Using Light Absorption and Scanning Electron Microscopic Methods ( Plasma Processing)
• Fabrication of Nanoparticle Composite Porous Films Having Ultralow Dielectric Constant
• Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
• Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films
• Effects of Gas Temperature Gradient, Pulse Discharge Modulation, and Hydrogen Dilution on Particle Growth in Silane RF Discharges
• Structure of Intrinsic States of K^π=0^+ Bands in ^Ne : Study of Transient Character
• Histological distribution of FR-1, a cyclic RGDS-peptide, binding sites during early embryogenesis, and isolation and initial characterization of FR-1 receptor in the sand dollar embryo
• Synthesis of RGDFPASS-containing Cystine Peptides and Isolation of RGD-recognizing Receptor in Sand Dollar Embryo by the Peptide-Affinity Chromatography
• Structure and Activity of Fibronectin-related Peptides. The Role of Amino Acid Residues of Positions 5 and 6 in RGDSPASS-containing Cyclic Decapeptide(FR-1)
• The dansyl Group as a Molecular Probe for the Histochemical Localization of a Synthetic Fibronectin-related Peptide
• Design and Synthesis of Fibronectin-related Peptides. Ala-analogs of RGDSPASS Containing Cystine Peptide (FR-1)
• Design and Synthesis of Cyclic Fibronectin Related Peptides, RGDSPASS Containing Cystine Peptides
• Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
• Reaction Matrix Theory for Cluster States in Light Nuclei. II : Clustering Dependence of the Effective Interaction
• Reaction Matrix Theory for Cluster States in Light Nuclei. I : Be^8
• Application of Variational Principle with Natural Boundary Condition to Scattering in Generator Coordinate Method
• Synthesis of Fibronectin Related Peptides : N^α-Methyl Amino Acid-containing Peptides
• Realistic Effective Interaction between Nucleons in Cluster State of Light Nuclei : Starting-Energy-Dependent Interaction and Its Application to Alpha-Cluster plus ^O-Core Model of ^Ne
• Roles of SiH3 and SiH2 Radicals in Particle Growth in rf Silane Plasmas
• The color isomerism of oxovanadium(IV) complexes with tetradentate schiff base.

もっと見る 閉じる

スポンサーリンク