Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-05-01
著者
-
Takahashi K
National Inst. Res. In Inorganic Materials Ibaraki Jpn
-
Hori Masaru
Department Of Quantum Engineering Nagoya University
-
GOTO Toshio
Department of Quantum Engineering, Nagoya University
-
Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
-
Miyata K
Kobe Steel Ltd. Kobe Jpn
-
Takahashi K
Department Of Physical Electronics Tokyo Institute Of Tecnology
-
KISHIMOTO Shigeru
Department of Quantum Engineering, Nagoya University
-
Takahashi K
Tokyo Inst. Technol. Yokohama Jpn
-
Kishimoto Shigeru
Department Of Quantum Engineering School Of Engineering Nagoya University
-
Kishimoto Shigeru
Department Of Electrical Engineering Faculty Of Engineering Nagoya University
-
Takahashi Kuniharu
Graduate School Of Science And Technology Niigata University
-
Takahashi Kouchiro
National Institute For Research In Inorganic Materials
-
TAKAHASHI Kunimasa
Department of Quantum Engineering, School of Engineering, Nagoya Univeristy
-
MARUYAMA Koji
Department of Quantum Engineering, Nagoya University
-
Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
-
Miyata Koji
Department Of Quantum Engineering School Of Engineering Nagoya University
-
Maruyama Koji
Department Of Aerospace Engineering Osaka Prefecture University
-
Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
-
TAKAHASHI Kenji
Semiconductor Research Laboratory, Pioneer Electronic Corporation
-
GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
関連論文
- Crystallizing Process of Amorphous Thick Films of Ferroelectric Lead Germanate Family ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
- Extraction of Microwave Pulses from a Cavity Using a Y-Ba-Cu-O Superconducting Film Switch
- Fabrication of Carbon Nanowalls Using Novel Plasma Processing
- A Study on Zinc Isotope Fractionation in a Benzo Crown Resin/Acetone System
- Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
- Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
- High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
- Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
- High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition