H_2 Partial Pressure Dependences of CH_3 Radical Density and Effects of H_2 Dilution on Carbon Thin-Film Formation in RF Discharge CH_4 Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-01-15
著者
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NAITO Shinya
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Hattori Tadashi
Research Laboratories, Nippondenso Co., Ltd.
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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Hattori Tadashi
Research Laboratories Nippondenso Co. Ltd.
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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NAITO Susumu
Research Laboratories Nippondenso Co., Ltd.
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ITO Nobuei
Research Laboratories Nippondenso Co., Ltd.
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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Naito Susumu
Research Laboratories Nippondenso Co. Ltd.:department Of Information Electronics Nagoya University
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Hattori Tadashi
Research Laboratories Denso Corporation
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Ito N
Tottori Univ. Tottori Jpn
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Hattori Takeo
Faculty Of Engineering Musashi Institute Of Technology
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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HATTORI TADASHI
Research Center for Advanced Waste and Emission Management, Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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