Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2003-03-01
著者
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Hori Masaru
Department Of Quantum Engineering Nagoya University
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Hori M
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Hiramatsu Mineo
Department Of Electrical And Electronic Engineering Meijo University
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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NAGAI Hisao
Department of Quantum Engineering, Nagoya University
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Nagai Hisao
Department Of Quantum Engineering Nagoya University
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Nagai Hisao
Department Of Chemistry College Of Humanities And Sciences Nihon University
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Goto T
Department Of Quantum Engineering Nagoya University
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Goto T
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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HIRAMATSU Mineo
Department of Electrical and Electronic Engineering, Meijo University
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