Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma
スポンサーリンク
概要
- 論文の詳細を見る
The effect of O2 additions below 0.2% to N2 was investigated for the cleaning of organic contaminants on an indium tin oxide film using a nonequilibrium atmospheric-pressure pulsed plasma. A remarkably high cleaning efficiency was obtained for plasma treatment with additions from 0.025 to 0.1% O2 to N2. The concentration of the ground state oxygen radical [O(3P)] was measured using vacuum UV laser absorption spectroscopy. It was found that the key factor for the surface cleaning was the scission of carbon bonds due to UV emissions, and subsequent oxidation due to O(3P) and ozone.
- 2007-06-25
著者
-
Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
-
Ito Masafumi
Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo Universi
-
Iwasaki Masahiro
Department Of Mechanical Engineering Doshisha University
-
Uehara Tsuyoshi
Sekisui Chemical Co. Ltd.
-
Takeda Keigo
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Takeda Keigo
Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
-
Yara Takuya
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
-
Uehara Tsuyoshi
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
-
Iwasaki Masahiro
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
関連論文
- Fluorescent In Situ Hybridization 1p/19q Deletion/Imbalance Analysis of Low-Grade and Atypical Meningiomas
- Moyamoya Disease Associated With Pulmonary Sarcoidosis : Case Report
- Sustained Remission after Rituximab-containing Chemotherapy for Intravascular Large B-cell Lymphoma
- Wilms' tumor 1 message and protein expression in bone marrow failure syndrome and acute leukemia
- Epigenetic Regulation of CD20 Protein Expression in a Novel B-Cell Lymphoma Cell Line, RRBL1, Established from a Patient Treated Repeatedly with Rituximab-Containing Chemotherapy
- Successful Treatment with Imatinib Mesylate of a CML Patient in Megakaryoblastic Crisis with Severe Fibrosis
- High Titer of ADAMTS13 Inhibitor Associated with Thrombotic Microangiopathy of the Gut and Skeletal Muscle after Allogeneic Hematopoietic Stem Cell Transplantation
- In vivo Effects of a Histone Deacetylase Inhibitor, FK228, on Human Acute Promyelocytic Leukemia in NOD/Shi-scid/scid Mice
- Neutron Scattering Studies of Pyrochlore Compound Nd_2Mo_2O_7 in Magnetic Field
- Static Correlation and Dynamical Properties of Tb^-moments in Tb_2Ti_2O_7 : Neutron Scattering Study
- Neutron Scattering Study of the Spin Correlation in the Spin Ice System Ho_2Ti_2O_7
- Detailed Structure of the Magnetic Excitation Spectra of YBa_2Cu_3O_y and Its Implication on the Physical Characteristics of the Electron System
- Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
- High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
- Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
- Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
- Development of Compact C_2F_4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
- Octave Spanning High Quality Super Continuum Generation Using 10nJ and 104fs High Energy Ultrashort Soliton Pulse
- Combinatorial Plasma Etching Process
- Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process
- Control of Electric Conduction of Carbon Nanowalls
- Electrical Characterization of Carbon Nanowalls
- High Performance of Silicon Oxide Selective Etching Using F_2 Gas and Graphite Instead of Perfluorinated Compound Gases
- Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma
- Behaviors of carbon atom density in hydrocarbon and fluorocarbon plasmas
- Measurement of Einstein's A Coefficient of the 296.7 nm Transition Line of the Carbon Atom
- Measurement of Carbon Atom Density in High Density Plasma Process
- Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
- Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
- Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
- CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
- Evaluation of CF_2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO_2 Etching Process Using Radical Injection Technique
- CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
- Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma
- CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
- Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
- Spatial distributions of electron, CF, and CF2 radical densities and gas temperature in DC-superposed dual-frequency capacitively coupled plasma etch reactor employing cyclic-C4F8/N2/Ar gas
- Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
- Measurement of Spatial Distribution of SiF_4 and SiF_2 Densities in High Density SiF_4 Plasma Using Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
- Spatial Distribution Measurement of Absolute Densities of CF and CF_2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
- Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar^+ Beam with Hydrogen and Fluorocarbon Radical Injection
- Effects of Dilution Gases on Si Atoms and SiHx^^+ (X = 0-3) Ions in Electron Cyclotron Resonance SiH_4 Plasmas
- Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
- Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source
- Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source
- Measurement of Hydrogen Radical Density and Its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases
- Surface Loss Probability of Nitrogen Atom on Stainless-Steel in N2 Plasma Afterglow
- Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF4 Plasmas
- Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
- Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-$k$ Films in H2/N2 Plasma Etching
- Development of Compact C2F4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
- Synthesis of Fluorinated SiN_x Gate Dielectric Films Using ECR-PECVD Employing SiF_4/N_2/H_2 Gases
- Ultrathin Fluorinated Silicon Nitride Gate Dielectric Films Formed by Plasma Enhanced Chemical Vapor Deposition Employing NH_3 and SiF_4
- Control of Ion Bombardment and Species for Ultra Low Temperature Formation of Silicon Nitride Gate Dielectric Films Using Plasma Chemical Vapor Deposition
- Contrast Enhancement of Wavelength-Selective Detection of Mid-Infrared Using Localized Atmospheric-Pressure Plasma Treatment
- Novel atmospheric pressure inductively coupled micro plasma source using floating wire electrode (Special issue: Plasma processing)
- Dependence of Surface-Loss Probability of Hydrogen Atom on Pressures in Very High Frequency Parallel-Plate Capacitively Coupled Plasma
- Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma
- Floating Wire for Enhancing Ignition of Atmospheric Pressure Inductively Coupled Microplasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Temperature and Density of CF Radicals in 60 MHz Capacitively Coupled Fluorocarbon Gas Plasma
- Radical Behavior in Fluorocarbon Plasma and Control of Silicon Oxide Etching by Injection of Radicals
- Aligned Growth of Single-Walled and Double-Walled Carbon Nanotube Films by Control of Catalyst Preparation
- High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
- Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
- Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F2/Ar Gases
- Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma
- Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source
- Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma
- Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
- Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature
- Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation
- Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition
- Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition
- Fabrication of Carbon Nanowalls on Carbon Fiber Paper for Fuel Cell Application
- High-Performance Decomposition and Fixation of Dry Etching Exhaust Perfluoro-Compound Gases and Study of Their Mechanism
- Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing
- H2/N2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition
- An Autonomously Controllable Plasma Etching System Based on Radical Monitoring
- Surface Modification Process of Contact Lens Using Three-Phase AC Excited Nonequilibrium Atmospheric Pressure Ar Plasma
- Novel Silicon Wafer Slicing Technology Using Atmospheric-Pressure Reactive Microplasma
- Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
- Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
- Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes
- Inactivation Process of Penicillium digitatum Spores Treated with Non-equilibrium Atmospheric Pressure Plasma
- Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO
- Roles of SiH3 and SiH2 Radicals in Particle Growth in rf Silane Plasmas
- Optical-Fiber-Type Broadband Cavity Ring-Down Spectroscopy Using Wavelength-Tunable Ultrashort Pulsed Light
- Development and Characterization of a New Compact Microwave Radical Beam Source
- Fabrication of Carbon Nanowalls Using Novel Plasma Processing
- Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH4 Plasma with Ar, N2, and H2 Dilution Gases
- Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
- Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N2 and H2 Gas Chemistry
- Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
- Amorphous Silicon and Tungsten Etching Employing Environmentally Benign Plasma Process
- Low-$k$ SiOCH Film Etching Process and Its Diagnostics Employing Ar/C5F10O/N2 Plasma
- Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes (Special Issue : Dry Process)
- A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
- Optical-Fiber-Type Broadband Cavity Ring-Down Spectroscopy Using Wavelength-Tunable Ultrashort Pulsed Light
- Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO_2 on Carbon Nanowalls