An Autonomously Controllable Plasma Etching System Based on Radical Monitoring
スポンサーリンク
概要
- 論文の詳細を見る
The optimum conditions for a plasma etching device are generally determined from the results of etching a sample while varying an external parameter (e.g., gas mass flow, gas mixing ratio, process chamber pressure, or plasma source power). However, to realize controlled plasma etching with few fluctuations on a subnanometer scale, it is essential to develop a system that is controlled in real-time based on internal plasma parameters (e.g., densities and energies of radicals and ions), which directly determine process characteristics, rather than external plasma parameters. We have developed an autonomously controlled plasma etching system that performs integrated monitoring of radicals in the gas phase and on the surface of films. The etching rate of organic materials could be autonomously controlled based on hydrogen and nitrogen radical densities obtained in real-time.
- 2012-07-25
著者
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Den Shoji
Katagiri Engineering Co. Ltd.
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Takahashi Shunji
Katagiri Engineering Co. Ltd.
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Ito Masafumi
Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo Universi
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Suzuki Tatsuya
Department Of Chemistry And Biotechnology School Of Engineering The University Of Tokyo
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Takeda Keigo
Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Takahashi Shunji
Katagiri Engineering Co., Ltd., Yokohama 230-0003, Japan
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Ohta Takayuki
Department of Chemistry, Graduate School of Science, The University of Tokyo
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Den Shoji
Katagiri Engineering Co., Ltd., Yokohama 230-0003, Japan
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Takashima Seigo
Plasma Center for Industrial Applications, Nagoya Industries Promotion Corporation, Nagoya 463-0003, Japan
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Takashima Seigo
Plasma Center for Industrial Applications, Nagoya Urban Industries Promotion Corporation, Nagoya 463-0003, Japan
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Kano Hiroyuki
NU-Eco Engineering Co., Ltd., Ooaza, Kurozasa Aza, Umazutsumi, Miyoshi, Aichi 470-0201, Japan
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Kawauchi Ryota
COM Electronics Development Co., Ltd., Hidaka, Saitama 350-1221, Japan
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Katagiri Toshiro
Katagiri Engineering Co., Ltd., Yokohama 230-0003, Japan
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Suzuki Tatsuya
Department of Mechanical Science and Engineering, Nagoya University, Nagoya 464-8603, Japan
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