H2/N2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition

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概要

• 論文の詳細を見る

• Etching resistance of carbon films deposited by plasma chemical vapor deposition (CVD) is one of the concerns to fabricate nanostructures using such carbon films as protective coating films and dummy films. We have carried out H2/N2 plasma etching of carbon films deposited by using an H-assisted plasma CVD method. The etching rate of carbon films decreases exponentially with increasing the mass density of carbon films from 1.51 to 2.27 g/cm3. The mass density of carbon films is the key parameter to tune the etching resistance.

• 2013-01-25

著者

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• Shiratani Masaharu

  Department Of Electoronics Kyushu University

• Koga Kazunori

  Department Of Advanced Energy Engineering Sciences Interdisciplinary Graduate School Of Engineering

• Sekine Makoto

  Department Of Electrical Engineering And Computer Science Nagoya University

• Setsuhara Yuichi

  Joining And Welding Research Institute Osaka University

• UCHIDA Giichiro

  Department of Electric and Electronics Graduate School of Information Science and Electrical Enginee

• Takeda Keigo

  Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan

• Matsuzaki Hidefumi

  Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan

• YAMASHITA Daisuke

  Department of Food Science and Technology, Faculty of Agriculture, Kyoto University

• Koga Kazunori

  Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Urakawa Tatsuya

  Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Torigoe Ryuhei

  Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Uchida Giichiro

  Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Shiratani Masaharu

  Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Yamashita Daisuke

  Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

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