Shiratani Masaharu | Department Of Electoronics Kyushu University

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著作論文

Reincrease in Electron Density in the Current-Decaying Phase of Pulsed-Discharge of Argon-Hydrogen Mixture : Nuclear Science, Plasmas and Electric Discharges
Generation of a Large Swelling in the Spatial Magnetic Field Profile near the Coil Axis of a Theta Pinch
On Shifting of Plowed Plasma to Back of Current Sheath in Implosion Phase of Theta-Pinch
Generation of Magnetic Islands Caused by Periodical Nonuniformity of Axial Magnetic Field for FRC Formation Phase
Study on Electron Density Dependence of Metastable Ar^+ Density in Pulsed-Discharge Plasma by Using LIF Method
On Applicability of Laser-Induced Fluorescence from the Metastable State of Argon Ions to Ion Density Measurements
Dependence of Evolution of Field Reconnection at Coil End Region on Mirror Field in FRC Formation Stage
Combinatorial Plasma Etching Process
In Situ Observation of Particle Behavior in rf Silane Plasmas
Development of Photon-Counting Laser-Light-Scattering Method for Detection of Nano-Particles Formed in CVD Plasmas (レ-ザ-および放射光の半導体プロセス分野への応用特集号)
Growth Kinetics and Behavior of Dust Particles in Silane Plasmas
Combinatorial Analysis of Plasma–Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy
Investigation of Particulate Growth Processes in RF Silane Plasmas Using Light Absorption and Scanning Electron Microscopic Methods ( Plasma Processing)
Fabrication of Nanoparticle Composite Porous Films Having Ultralow Dielectric Constant
Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films
Effects of Gas Temperature Gradient, Pulse Discharge Modulation, and Hydrogen Dilution on Particle Growth in Silane RF Discharges
Modeling of Particle Growth in RF Silane-Helium Plasma ( Plasma Processing)
Filling Subquarter-Micron Trench Structure with High-Purity Copper Using Plasma Reactor with H Atom Source
Conformal Deposition of High-Purity Copper Using Plasma Reactor with H Atom Source
Effects of Gas Flow on Particle Growth in Silane RF Discharges
Study on Initial Growth of Particles in Low-Pressure and Low-Power GeH_4 RF Discharges Using the High-Sensitivity Photon-Counting Laser-Light-Scattering Method
Transition of Particle Growth Region in SiH_4 RF Discharges
Similarities in Spatial Distributions of Absolute GeH_2 Density, Radical Production Rate and Particle Amount in GeH_4 RF Discharges
Particle Growth Kinetics in Silane RF Discharges
Study on Growth Processes of Subnanometer Particles in Early Phase of Silane RF Discharge ( Plasma Processing)
Detection of Negative Ions in a Helium-Silane RF Plasma
Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasmas
Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
Subacute Pulmonary Toxicity of Copper Indium Gallium Diselenide Following Intratracheal Instillations into the Lungs of Rats
H2/N2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition
Roles of SiH3 and SiH2 Radicals in Particle Growth in rf Silane Plasmas
Temperature Dependence of Dielectric Constant of Nanoparticle Composite Porous Low-$k$ Films Fabricated by Pulse Radio Frequency Discharge with Amplitude Modulation
Characterization of Dust Particles Ranging in Size from 1 nm to 10 µm Collected in the LHD
Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition

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