Detection of Negative Ions in a Helium-Silane RF Plasma
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概要
- 論文の詳細を見る
In order to detect negative ions in a helium-silane rf plasma, temporal evolutions of the densities of electrons and ions are observed by square-wave-amplitude modulation of an rf discharge voltage. Densities of electrons and ions are deduced using a microwave interferometer and ion saturation current of a Langmuir probe, respectively. The experiments show that negative ions are formed in the plasma even for a low concentration of 0.5% silane and their density is estimated to be about 10^9 cm^<-3> which is comparable to the electron density. The energy of electrons which form negative ions due to attachment is estimated to be below 8.9 eV, that is, below the resonance peak energy of dissociative electron attachment to SiH_4.
- 社団法人応用物理学会の論文
- 1992-12-15
著者
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渡部 行男
九大院理
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Shiratani M
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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Eto Kenji
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Fukuzawa Tsuyoshi
Department Of Electronic Device Engineering Graduate School Of Information Science And Electrical En
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Watanabe Yukio
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Shiratani Masaharu
Department of Electoronics, Kyushu University
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Fukuzawa Tsuyoshi
Department of Electronic Device Engineering, Graduate School of Information Science and Electrical Engineering, Kyushu University
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