Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-12-10
著者
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渡部 行男
九大院理
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Watanabe Yoshihide
Department Of Electronics Faculty Of Engineering Tottori University
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Watanabe Yoshihide
Toyota Central Research And Development Laboratories Inc.
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WATANABE Yukio
Department of Human Genetics, Nagasaki University Graduate School of Biomedical Sciences
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Koga Kenji
National Institute For Advanced Interdisciplinary Research
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渡部 行男
九州工業大学工学部電気工学科
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Watanabe Y
Kyushu Univ. Fukuoka Jpn
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SHIRATANI Masaharu
Department of Electrical Engineering, Faculty of Engineering, Kyushu University
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Shiratani M
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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KOGA Kazunori
Department of Advanced Energy Engineering Sciences, Interdisciplinary Graduate School of Engineering
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Watanabe Yukio
Department Of Electrical Engineering Sciences Faculty Of Engineering Sciences Kyushu University
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Ikeda Shingo
Asm Japan K.k.
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Koga K
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Koga Kazunori
Department Of Advanced Energy Engineering Sciences Interdisciplinary Graduate School Of Engineering
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Inoue Toshihisa
Department of Cardiology, Chiba Cardiovascular Center
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Inoue Toshihisa
Department Of Cardiology Chiba Cardiovascular Center
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Inoue Toshihisa
Department Of Electoronics Kyushu University
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BANDO Kouki
Department of Electoronics, Kyushu University
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IWASHITA Shinya
Department of Electoronics, Kyushu University
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Watanabe Yukio
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Bando Kouki
Department Of Electoronics Kyushu University
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Iwashita Shinya
Department Of Electoronics Kyushu University
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Koga Kazunori
Department of Electoronics, Kyushu University
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Shiratani Masaharu
Department of Electoronics, Kyushu University
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