Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films
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概要
- 論文の詳細を見る
We have developed a novel plasma chemical vapor deposition (PCVD) method for preparing high quality hydrogenated amorphous silicon (a-Si:H) films, which suppresses effectively growth of clusters by transporting them out of the reactor using gas flow and thermophoresis. By utilizing this cluster-suppressed PCVD method, we have demonstrated deposition of quite high quality a-Si:H films, microstructure parameter R_α of which can be reduced below 0.003. The decrease in R_αvalue is closely related to the decrease in cluster amount. Preliminary evaluation of fill factor (FF) of the a-Si:H Schottky solar cell of the a-Si:H films of R_α= 0.057 shows the high initial value FF_i = 0.57 and high stabilized value after-light-soaking FF_a = 0.53.
- 社団法人応用物理学会の論文
- 2002-02-15
著者
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渡部 行男
九大院理
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Watanabe Yoshihide
Department Of Electronics Faculty Of Engineering Tottori University
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Watanabe Yoshihide
Toyota Central Research And Development Laboratories Inc.
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WATANABE Yukio
Department of Human Genetics, Nagasaki University Graduate School of Biomedical Sciences
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Koga Kenji
National Institute For Advanced Interdisciplinary Research
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渡部 行男
九州工業大学工学部電気工学科
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Watanabe Y
Kyushu Univ. Fukuoka Jpn
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SHIRATANI Masaharu
Department of Electrical Engineering, Faculty of Engineering, Kyushu University
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Shiratani M
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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KOGA Kazunori
Department of Advanced Energy Engineering Sciences, Interdisciplinary Graduate School of Engineering
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Koga K
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Koga Kazunori
Department Of Advanced Energy Engineering Sciences Interdisciplinary Graduate School Of Engineering
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KAI Motohide
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu
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SHIKATANI Nobuhiro
Department of Functional Materials, Fukuoka Institute of Technology
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Watanabe Yukio
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Shikatani Nobuhiro
Department Of Functional Materials Fukuoka Institute Of Technology
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Kai Motohide
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Koga Kazunori
Department of Electoronics, Kyushu University
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Shiratani Masaharu
Department of Electoronics, Kyushu University
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