Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
-
Shiratani Masaharu
Department Of Electoronics Kyushu University
-
Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
-
Takenaka Kosuke
Joining And Welding Research Institute Osaka University
-
Cho Ken
Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Japan
-
Hori Masaru
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan
-
Sekine Makoto
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan
関連論文
- Plasma-Wall Interactions in Dual Frequency Narrow-Gap Reactive Ion Etching System
- Reincrease in Electron Density in the Current-Decaying Phase of Pulsed-Discharge of Argon-Hydrogen Mixture : Nuclear Science, Plasmas and Electric Discharges
- Generation of a Large Swelling in the Spatial Magnetic Field Profile near the Coil Axis of a Theta Pinch
- On Shifting of Plowed Plasma to Back of Current Sheath in Implosion Phase of Theta-Pinch
- Generation of Magnetic Islands Caused by Periodical Nonuniformity of Axial Magnetic Field for FRC Formation Phase
- Study on Electron Density Dependence of Metastable Ar^+ Density in Pulsed-Discharge Plasma by Using LIF Method
- On Applicability of Laser-Induced Fluorescence from the Metastable State of Argon Ions to Ion Density Measurements
- Dependence of Evolution of Field Reconnection at Coil End Region on Mirror Field in FRC Formation Stage
- Combinatorial Plasma Etching Process
- Effects of Ion-Beam-Irradiation on Morphology and Densification of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units
- Zr-based Hydrogen Absorbing Films Prepared by Ion Beam Assisted Deposition(Physics, Processes, Instruments & Measurements)
- Tribological Property of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- In Situ Observation of Particle Behavior in rf Silane Plasmas
- Development of Photon-Counting Laser-Light-Scattering Method for Detection of Nano-Particles Formed in CVD Plasmas (レ-ザ-および放射光の半導体プロセス分野への応用特集号)
- Growth Kinetics and Behavior of Dust Particles in Silane Plasmas
- Formation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering
- Ion Assisted Deposition of Crystalline TiNi Films by electron Cyclotron Resonance Plasma Enhanced Sputtering
- Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
- Inductively-Coupled-Plasma-Assisted Planar Magnetron Discharge for Enhanced Ionization of Sputtered Atoms
- Combinatorial Analysis of Plasma–Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy
- Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet
- Investigation of Particulate Growth Processes in RF Silane Plasmas Using Light Absorption and Scanning Electron Microscopic Methods ( Plasma Processing)
- Fabrication of Nanoparticle Composite Porous Films Having Ultralow Dielectric Constant
- Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
- Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films
- Effects of Gas Temperature Gradient, Pulse Discharge Modulation, and Hydrogen Dilution on Particle Growth in Silane RF Discharges
- Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma
- Modeling of Particle Growth in RF Silane-Helium Plasma ( Plasma Processing)
- Filling Subquarter-Micron Trench Structure with High-Purity Copper Using Plasma Reactor with H Atom Source
- Conformal Deposition of High-Purity Copper Using Plasma Reactor with H Atom Source
- Effects of Gas Flow on Particle Growth in Silane RF Discharges
- In-situ Time-Resolved Infrared Spectroscopic Study of Silicon-Oxide Surface during Selective Etching over Silicon in Fluorocarbon Plasma
- Study on Initial Growth of Particles in Low-Pressure and Low-Power GeH_4 RF Discharges Using the High-Sensitivity Photon-Counting Laser-Light-Scattering Method
- Transition of Particle Growth Region in SiH_4 RF Discharges
- Similarities in Spatial Distributions of Absolute GeH_2 Density, Radical Production Rate and Particle Amount in GeH_4 RF Discharges
- Particle Growth Kinetics in Silane RF Discharges
- Study on Growth Processes of Subnanometer Particles in Early Phase of Silane RF Discharge ( Plasma Processing)
- Detection of Negative Ions in a Helium-Silane RF Plasma
- Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna
- Simulation-Aided Designing of Meter-Scale Large-Area Plasma Source with Multiple Low-Inductance Antenna Modules
- Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasmas
- Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF into N Downflow Plasma
- Quantum Chemical Investigation for Chemical Dry Etching of SiO by Flowing NF into H Downflow Plasma
- Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Surface Modification of Polyimide for Improving Adhesion Strength by Inductively Coupled Plasma
- Low-Temperature Deposition of Zinc Oxide Film by Plasma-Assisted Mist Chemical Vapor Deposition (Special Issue : Dry Process)
- Subacute Pulmonary Toxicity of Copper Indium Gallium Diselenide Following Intratracheal Instillations into the Lungs of Rats
- Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films Using Solution of Zinc Acetate
- H2/N2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition
- Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
- Characterization of Ion Energy Distribution in Inductively Coupled Argon Plasmas Sustained with Multiple Internal-Antenna Units
- Dissociations of C
- Roles of SiH3 and SiH2 Radicals in Particle Growth in rf Silane Plasmas
- Temperature Dependence of Dielectric Constant of Nanoparticle Composite Porous Low-$k$ Films Fabricated by Pulse Radio Frequency Discharge with Amplitude Modulation
- Photoluminescence Study of Plasma-Induced Damage of GaInN Single Quantum Well
- Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
- Characterization of Dust Particles Ranging in Size from 1 nm to 10 µm Collected in the LHD
- Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
- Plasma Interactions with Organic Materials in Liquid through Plasma/Liquid Interface
- Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films
- Photoluminescence Study of Plasma-Induced Damage of GaInN Single Quantum Well (Special Issue : Recent Advances in Nitride Semiconductors)
- Tribological Property of CeO2 Films Prepared by Ion-Beam-Assisted Deposition
- Dissociations of C₅F₈ and C₅HF₇ in Etching Plasma (Special Issue : Dry Process)
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
- Direct exposure of non-equilibrium atmospheric pressure plasma confers simultaneous oxidative and ultraviolet modifications in biomolecules