Quantum Chemical Investigation for Chemical Dry Etching of SiO by Flowing NF into H Downflow Plasma
スポンサーリンク
概要
著者
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Kono Akihiro
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Hayashi Toshio
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Suu Koukou
Institute for Semiconductor and Electronics Technologies, ULVAC Inc., Susono, Shizuoka 410-1231, Japan
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Ishikawa Kenji
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Hori Masaru
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Sekine Makoto
Plasma Nano-technology Research Center, Nagoya University, Nagoya 464-8603, Japan
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