Temperature Dependence of Dielectric Constant of Nanoparticle Composite Porous Low-$k$ Films Fabricated by Pulse Radio Frequency Discharge with Amplitude Modulation
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概要
- 論文の詳細を見る
Nanoparticle composite porous low-$k$ films are deposited by pulse radio frequency (RF) discharge with the amplitude modulation (AM) of discharge voltage. The deposition rate obtained with AM is 0.65 nm/s, which is sevenfold as high as that obtained without AM, and porosity = 60–63% and dielectric constant $k = 1.1--1.4$ for the films obtained with AM are nearly equal to those obtained without AM. The deposition of porous low-$k$ films by pulse RF discharge with AM is a promising method for increasing the deposition rate with a less pronounced agglomeration and without variations in the properties of the films. With decreasing substrate temperature from 403 to 368 K, the porosity of the films increases from 3.5 to 60%, leading to a reduction in their dielectric constant from 2.9 to 1.4. Substrate temperature is a key parameter that determines the porosity and dielectric constant of the porous low-$k$ films.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-08-25
著者
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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Koga Kazunori
Department Of Advanced Energy Engineering Sciences Interdisciplinary Graduate School Of Engineering
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Iwashita Shinya
Department Of Electoronics Kyushu University
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Shiratani Masaharu
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
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Matsuzaki Hidefumi
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
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Iwashita Shinya
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
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Koga Kazunori
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
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Morita Michihito
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
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