Filling Subquarter-Micron Trench Structure with High-Purity Copper Using Plasma Reactor with H Atom Source
スポンサーリンク
概要
著者
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Shiratani M
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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Jin Hong
Dept.of Electronic Device Eng. Grad.school Of Information Science And Electrical Eng. Kyushu Univ.
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SHIRATANI Masaharu
Dept.of Electronic Device Eng.,Grad.School of Information Science and Electrical Eng.,Kyushu Univ.
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NAKATAKE Yasuhiro
Dept.of Electronic Device Eng.,Grad.School of Information Science and Electrical Eng.,Kyushu Univ.
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Nakatake Yasuhiro
Dept.of Electronic Device Eng. Grad.school Of Information Science And Electrical Eng. Kyushu Univ.
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Shiratani Masaharu
Department of Electoronics, Kyushu University
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